Dr. Nelson M. Felix
Senior Manager - Patterning Research at IBM Research
SPIE Involvement:
Conference Chair | Author | Editor
Publications (82)

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 28 April 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Showing 5 of 82 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 13 April 2020

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 22 May 2018

Conference Committee Involvement (5)
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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