Dr. Nick Cobb
Deceased at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Optical proximity correction, Feedback control, Photomasks, Logic, Visualization, Semiconducting wafers, Diffraction, Lithography, Detection and tracking algorithms, Critical dimension metrology

Proceedings Article | 16 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical proximity correction, Printing, Binary data, Point spread functions, SRAF, Semiconducting wafers, Optical lithography, Convolution, Phase shifts

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Process modeling, Optical proximity correction, Convolution, Diffusion, Scanning electron microscopy, Photoresist processing, Optical lithography, Instrument modeling, Visualization, Curium

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Printing, Resolution enhancement technologies, Semiconducting wafers, Lithography, Silicon, Defect detection, Virtual reality

Showing 5 of 42 publications
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