Dr. Nicolette S. Fender
Sr. Development Engineer at JSR Micro Inc
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Publications (11)

Proceedings Article | 19 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

Proceedings Article | 30 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polishing, Optical lithography, Etching, Copper, Dielectrics, Photoresist materials, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Einsteinium, Etching, Dielectrics, Photoresist materials, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Particles, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing, Semiconducting wafers

Showing 5 of 11 publications
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