Nicolo Morgana
Senior Staff Engineer at Infineon Technologies Dresden
SPIE Involvement:
Publications (19)

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Ions, Manufacturing, Doping, Photomasks, Ion implantation, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers, Grayscale lithography

Proceedings Article | 26 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Oxides, Visualization, Etching, Metals, Silicon, Manufacturing, Computer simulations, Signal processing, Optical alignment, Semiconducting wafers

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Oxides, Lithography, Etching, Ions, Atomic force microscopy, Photoresist materials, Photomasks, Reactive ion etching, Semiconducting wafers, Grayscale lithography

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

Showing 5 of 19 publications
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