Dr. Nigel P. Smith
Technical Fellow at Nanometrics Inc
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 6 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Wafer-level optics, Oxides, Detection and tracking algorithms, Error analysis, Silicon, Reflectivity, Precision measurement, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Diffraction, Metrology, Image processing, Error analysis, Distortion, Process control, Photomasks, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Carbon, Data modeling, Spectroscopy, Error analysis, Scatterometry, Reflectometry, Process control, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical components, Diffraction, Metrology, Time metrology, Spectroscopic ellipsometry, Integrated circuits, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Data modeling, Etching, Spectroscopy, Scatterometry, Double patterning technology, Semiconducting wafers, Overlay metrology

Showing 5 of 36 publications
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