Prof. Nikolay B. Voznesenskiy Profile

Prof. Nikolay B. Voznesenskiy

CTO at Difrotec OÜ

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Author

Publications (31)

Proceedings Article | 7 June 2021 Paper

Testing surface form of precision optics by a point diffraction interferometer with two beams

Nikolay Voznesenskiy, Mariia Voznesenskaia, Lei Huang, Mourad Idir

Proceedings Volume 11853, 1185308 (2021) https://doi.org/10.1117/12.2595181

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Proceedings Article | 7 August 2018 Paper

Testing high accuracy optics using the phase shifting point diffraction interferometer

Nikolay Voznesenskiy, Mariia Voznesenskaia, Diwaker Jha

Proceedings Volume 10829, 1082902 (2018) https://doi.org/10.1117/12.2316330

KEYWORDS: Wavefronts, Aspheric lenses, Optical spheres, Optical testing, Spherical lenses, Optics manufacturing, Fringe analysis, Photovoltaics, Interferometers, Point diffraction interferometers

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Proceedings Article | 26 June 2017 Paper

Revealing features of different optical shaping technologies by a point diffraction interferometer

Nikolay Voznesenskiy, Mariia Voznesenskaia, Diwaker Jha, Heidi Ottevaere, Małgorzata Kujawińska, Maciej Trusiak, Kamil Liżewski

Proceedings Volume 10329, 103293X (2017) https://doi.org/10.1117/12.2270116

KEYWORDS: Point diffraction interferometers, Interferometers, Inspection, Diamond turning, Surface finishing, Interferometry, X-ray optics, Precision optics, Optical testing, Polishing, Wavefronts, Diffraction, Manufacturing, EUV optics

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Proceedings Article | 8 December 2016 Paper

Optical methods for measurements of surface shape in optical components for high power laser beam forming

Michał Józwik, Maciej Trusiak, Kamil Liżewski, Juan Martínez-Carranza, Nikolay Voznesenskiy, Małgorzata Kujawińska

Proceedings Volume 10159, 1015915 (2016) https://doi.org/10.1117/12.2263537

KEYWORDS: Interferometry, Optical testing, Optical components, High power lasers, Fringe analysis, Point diffraction interferometers, Wavefronts, Quality measurement, Interferometers, Optical spheres

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Proceedings Article | 22 June 2015 Paper

Point diffraction interferometry based on the use of two pinholes

Nikolay Voznesenskiy, Dongmei Ma, Chunshui Jin, Haitao Zhang, Jie Yu, Mariia Voznesenskaia, Tatiana Voznesenskaia, Wenlong Zhang

Proceedings Volume 9525, 95251K (2015) https://doi.org/10.1117/12.2184771

KEYWORDS: Wavefronts, Diffraction, Interferometry, Spherical lenses, Optical testing, Wave plates, Mirrors, Interferometers, Point diffraction interferometers, Phase shifting

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Proceedings Article | 13 May 2013 Paper

Concept, realization and performance of a two-beam phase-shifting point diffraction interferometer

Nikolay Voznesenskiy, Mariia Voznesenskaia, Natalia Petrova, Artur Abels

Proceedings Volume 8788, 878805 (2013) https://doi.org/10.1117/12.2020618

KEYWORDS: Wavefronts, Fringe analysis, Picosecond phenomena, Distortion, Phase shifts, Interferometry, Interferometers, Optical testing, Ferroelectric materials, Spherical lenses

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Proceedings Article | 18 December 2012 Paper

Alignment of phase-shifting interferograms in the two-beam point diffraction interferometer

Nikolay Voznesenskiy, Mariia Voznesenskaia, Natalia Petrova, Artur Abels

Proceedings Volume 8550, 85500R (2012) https://doi.org/10.1117/12.980910

KEYWORDS: Picosecond phenomena, Fringe analysis, Phase shifts, Wavefronts, Phase shifting, Ferroelectric materials, Interferometers, Interferometry, Diffraction, Calibration

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Proceedings Article | 23 March 2011 Paper

Large scale model of wafer topography effects

Nikolay Voznesenskiy, Hans-Jürgen Stock, Bernd Küchler, Hua Song, James Shiely, Lars Bomholt

Proceedings Volume 7973, 79732G (2011) https://doi.org/10.1117/12.879605

KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Optical proximity correction, Performance modeling, 3D modeling, Lithography, Data modeling, Optical imaging, Neodymium

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Proceedings Article | 10 March 2010 Paper

Virtual fab flow for wafer topography aware OPC

Hans-Jürgen Stock, Lars Bomholt, Dietmar Krüger, James Shiely, Hua Song, Nikolay Voznesenskiy

Proceedings Volume 7640, 76401U (2010) https://doi.org/10.1117/12.848440

KEYWORDS: Data modeling, Optical proximity correction, Semiconducting wafers, Photomasks, Calibration, Performance modeling, Wafer-level optics, Lithography, Near field optics, Silicon

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Small feature sizes down to the current 45 nm node and precision requirements of patterning in 193 nm lithography as well as layers where the wafer stack does not allow any BARC require - not only correction of optical proximity (OPC) effects originating from mask topography and imaging system, but also correction of wafer topography proximity (WTPC) effects as well. In spite of wafer planarization process steps, wafer topography (proximity) effects induced by different optical properties of the patterned materials start playing a significant role, and correction techniques need to be applied in order to minimize the impact. In this paper, we study a methodology to create fast models intended for effective use in OPC and WTPC procedures. In order to be short we use the terms "OPCWTPC modeling" and "OPCWTPC models" through the paper although it would be more correctly to take the terms "mask synthesis modeling" and "mask synthesis models". A comprehensive data set is required to build a reliable OPC model. We present a "virtual fab" concept using extensive test pattern sets with both 1D and 2D structures to capture optical proximity effects as well as wafer topography effects. A rigorous lithography simulator taking into account exposure tool source maps, topographic mask effects as well as wafer topography is used to generate virtual measurement data, which are used for model calibration as well as for model validation. For model building, we use a two step approach: in a first step, an OPC model is built using test patterns on a planar, homogenous substrate; in a second step a WTPC model is calibrated, using results from simulated test patterns on shallow trench isolation (STI) layer. This approach allows building models from experimental data, including hybrid approaches where only experimental data from planar substrates is available and a corresponding OPC model for the planar case can be retrofitted with capabilities for correcting wafer topography effects. We analyze the relevant effects and requirements for model building and validation as well as the performance of fast WTPC models.

Proceedings Article | 10 June 2004 Paper

Simulation of the EUV-lithography projection system and nanometer features imaging

Nikolay Voznesensky, Alexander Zhevlakov

Proceedings Volume 5482, (2004) https://doi.org/10.1117/12.560163

KEYWORDS: Mirrors, Computer simulations, Imaging systems, Extreme ultraviolet, Projection systems, Grazing incidence, Semiconducting wafers, Photomasks, Solids, Optical design

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Proceedings Article | 2 April 2004 Paper

Interferometers with diffraction on dot aperture for testing of shape errors of precise surfaces

Vladimir Kirillovsky, Nikolay Voznesensky, Michail Troukhine, Kyeong-Hee Lee

Proceedings Volume 5399, (2004) https://doi.org/10.1117/12.552324

KEYWORDS: Interferometers, Wavefronts, Diffraction, Fringe analysis, Optical components, Optical testing, Optics manufacturing, Light sources and illumination, Error analysis, Interferometry

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Proceedings Article | 2 April 2004 Paper

Concept of far-field optical evaluation of the apparatus function of an SNOM tip

Nikolay Voznesensky, Vadim Veiko, Tatiana Ivanova, Kyeong-Hee Lee

Proceedings Volume 5399, (2004) https://doi.org/10.1117/12.563864

KEYWORDS: Near field scanning optical microscopy, Near field optics, Spatial frequencies, Near field, Diffraction, Magnetism, Polarization, Optical microscopes, Computer simulations, Super resolution

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Proceedings Article | 26 February 2004 Paper

Principles of highest-precision optical parts estimation on the basis of a point-diffraction interferometer

Nikolay Voznesensky, Kyeong-Hee Lee, Vladimir Kirillovsky

Proceedings Volume 5252, (2004) https://doi.org/10.1117/12.512231

KEYWORDS: Interferometers, Wavefronts, Diffraction, Optical testing, Optical components, Image quality, Optics manufacturing, Spherical lenses, Coating, Fabry–Perot interferometers

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Proceedings Article | 17 October 2003 Paper

Optical interconnection optimization based on a classical approach

Vadim Veiko, Nikolay Voznesensky, Andrew Petrov, Valery Pashin, Natalya Voznesenskaya, Simeon Metev, Carsten Wochnowski

Proceedings Volume 4977, (2003) https://doi.org/10.1117/12.478608

KEYWORDS: Waveguides, Optical components, Optical fibers, Integrated optics, Near field optics, Optical circuits, Geometrical optics, Ray tracing, Optical interconnects, Diffraction

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Proceedings Article | 2 September 2003 Paper

Laser technology of SNOM-tips fabrication: process diagnostics, processing, and testing

Vadim Veiko, Alexey Kalachev, Lev Kaporsky, Sergey Volkov, Nikolay Voznesensky

Proceedings Volume 5121, (2003) https://doi.org/10.1117/12.515561

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Proceedings Article | 19 February 2003 Paper

Laser-based technology of scanning near-field optical probe fabrication: study of kinetics and progress of measuring

Vadim Veiko, Alexey Kalachev, Lev Kaporsky, Sergey Volkov, Nikolay Voznesensky

Proceedings Volume 4830, (2003) https://doi.org/10.1117/12.486565

KEYWORDS: Near field optics, Laser applications, Pyrometry, Near field, Mirrors, Temperature metrology, Projection systems, Fiber lasers, Spherical lenses, Quartz

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Proceedings Article | 14 December 2001 Paper

Automation of the construction creation process of the optical instrument and creations of designer documentation

Nadezhda Tolstoba, Nikolay Voznesensky, Olga Delnova, Anna Voznesenskya

Proceedings Volume 4487, (2001) https://doi.org/10.1117/12.450422

KEYWORDS: Computer aided design, Optical components, Optical design, Optics manufacturing, Optical instrument design, Software development, Chemical elements, Tolerancing, Mechanics, Mechanical engineering

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Proceedings Article | 5 December 2001 Paper

Use of vector diffraction theory in theoretical and experimental investigation of SNOM tips

Nikolay Voznesensky, Vadim Veiko

Proceedings Volume 4456, (2001) https://doi.org/10.1117/12.449528

KEYWORDS: Near field scanning optical microscopy, Diffraction, Spatial frequencies, Near field optics, Near field, Magnetism, Polarization, Computer simulations, Optical microscopes, Fourier transforms

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Proceedings Article | 29 June 2001 Paper

Laser-light delivery microtools based on laser technology: design, fabrication, and applications

Vadim Veiko, Nikolay Voznesensky

Proceedings Volume 4274, (2001) https://doi.org/10.1117/12.432528

KEYWORDS: Laser applications, Near field scanning optical microscopy, Fiber lasers, Spherical lenses, Geometrical optics, Lenses, Near field optics, Fiber optics, Gas lasers, Microlens

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Proceedings Article | 30 January 2001 Paper

Laser-based micropipettes: design, technology and applications

Vadim Veiko, Nikolay Voznesensky, Yury Voronin, Natalya Voznesenskaya, Natalya Markovkina, Vladimir Chuiko

Proceedings Volume 4157, (2001) https://doi.org/10.1117/12.413753

KEYWORDS: Glasses, Fourier transforms, Laser applications, Liquids, Wave propagation, Light wave propagation, Raster graphics, Near field scanning optical microscopy, Laser development, Technologies and applications

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Proceedings Article | 29 September 2000 Paper

Determination of geometric properties of SNOM tips by means of far-field evaluation

Soenke Seebacher, Wolfgang Osten, Werner Jueptner, Vadim Veiko, Nikolay Voznesensky

Proceedings Volume 4098, (2000) https://doi.org/10.1117/12.401617

KEYWORDS: Near field scanning optical microscopy, Near field optics, Glasses, Near field, Diffraction, Inverse optics, Wave propagation, Mirrors, Charge-coupled devices, Microscopes

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Proceedings Article | 7 June 2000 Paper

Achievements in near-field investigations in Russia (IFMO SPb)

Vadim Veiko, Nikolay Voznesensky, Tatyana Ivanova

Proceedings Volume 3933, (2000) https://doi.org/10.1117/12.387559

KEYWORDS: Near field scanning optical microscopy, Near field optics, Near field, Diffraction, Geometrical optics, Light scattering, Radio propagation, Mathematical modeling, Microscopes, Microscopy

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Proceedings Article | 25 October 1999 Paper

Polarization effects on image quality of optical systems with high numerical apertures

Nikolay Voznesensky, Alexander Belozubov

Proceedings Volume 3754, (1999) https://doi.org/10.1117/12.366347

KEYWORDS: Polarization, Image quality, Systems modeling, Fourier transforms, Wavefronts, Diffraction, Computer simulations, Point spread functions, Mechanics, Polarization analysis

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Proceedings Article | 27 September 1999 Paper

Principles and software for photolithographic optical system alignment and tolerancing

Sergey Rodionov, Nikolay Voznesensky, Nadezhda Tolstoba, Dmitry Gavrilin, Georgy Tychonchuk

Proceedings Volume 3780, (1999) https://doi.org/10.1117/12.363775

KEYWORDS: Monochromatic aberrations, Tolerancing, Distortion, Wavefronts, Optical alignment, Optical lithography, Lenses, Wavefront aberrations, Manufacturing, Matrices

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Proceedings Article | 22 September 1999 Paper

Optimum choice of basic functions for modeling light propagation through nanometer-sized structures

Nikolay Voznesensky

Proceedings Volume 3791, (1999) https://doi.org/10.1117/12.363853

KEYWORDS: Near field scanning optical microscopy, Near field optics, Diffraction, Metals, Light wave propagation, Fourier transforms, Geometrical optics, Light scattering, Polarization, Coating

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Proceedings Article | 20 September 1999 Paper

Peculiarities of laser-assisted drawing-out processing of optical probes for SNOM

Alexey Kalachev, Igor Smirnov, Vadim Veiko, Nikolay Voznesensky, Evgeny Yakovlev, Alexander Ejov, Dmitriy Muzychenko, Lev Kaporsky

Proceedings Volume 3822, (1999) https://doi.org/10.1117/12.364233

KEYWORDS: Near field optics, Near field scanning optical microscopy, Fiber lasers, Laser processing, Optics manufacturing, Quartz, Optical fibers, Near field, Manufacturing, Mirrors

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Proceedings Article | 15 July 1999 Paper

Optical nanoprobes for SNOM based on laser technology

Vadim Veiko, Nikolay Voznesensky, Igor Smirnov, Alexey Kalachev, Dmitry Ivanitski, Juriy Voronin, Michael Wolf, Krassimira Meteva

Proceedings Volume 3618, (1999) https://doi.org/10.1117/12.352709

KEYWORDS: Near field optics, Near field scanning optical microscopy, Optical fibers, Laser applications, Fiber lasers, Nanoprobes, Near field, Optical fabrication, Antennas, Transparency

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Proceedings Article | 7 May 1999 Paper

Determination of geometric properties of SNOM tips by means of combined far-field and near-field evaluation

Soenke Seebacher, Wolfgang Osten, Werner Jueptner, Vadim Veiko, Nikolay Voznesensky

Proceedings Volume 3740, (1999) https://doi.org/10.1117/12.347825

KEYWORDS: Near field scanning optical microscopy, Charge-coupled devices, Glasses, Objectives, Near field, Mirrors, Near field optics, Microscopes, Mathematical modeling, Diffraction

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Proceedings Article | 25 February 1999 Paper

New approach to optical measurements of small objects with superresolution

Vadim Veiko, Nikolay Voznesensky, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proceedings Volume 3736, (1999) https://doi.org/10.1117/12.340137

KEYWORDS: Visible radiation, Super resolution, Fourier transforms, Light sources, Mathematical modeling, Optical testing, Spatial frequencies, Zernike polynomials, Near field optics, Near field

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Proceedings Article | 20 January 1999 Paper

Optical nanoprobes for scanning near-field optical microscopy: functions, requirements, fabrication, and theoretical reconstruction from far-field investigation

Vadim Veiko, V. Voronin, Nikolay Voznesensky, Sergey Rodionov, Igor Smirnov, Alexey Kalachev

Proceedings Volume 3688, (1999) https://doi.org/10.1117/12.337544

KEYWORDS: Near field scanning optical microscopy, Near field optics, Nanoprobes, Optical microscopy, Near field, Fiber lasers, Antennas, Optical fibers, Aluminum, Laser applications

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Proceedings Article | 13 October 1998 Paper

New approach to analysis of subwavelength-sized secondary light sources

Nikolay Voznesensky, Vadim Veiko, Vitaly Domnenko, Alexey Goussev, Tatyana Ivanova, Sergey Rodionov

Proceedings Volume 3467, (1998) https://doi.org/10.1117/12.326833

KEYWORDS: Light sources, Near field scanning optical microscopy, Visible radiation, Near field, Near field optics, Fourier transforms, Super resolution, Spatial frequencies, Light wave propagation, Polarization

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Showing 5 of 31 publications

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