Dr. Nishrin Kachwala
Technology Development
SPIE Involvement:
Publications (12)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: SRAF, Machine learning, Optical proximity correction, Photomasks, Lithography, Model-based design, Source mask optimization, Computational lithography, Image processing

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Manufacturing, Tolerancing, Model-based design, Design for manufacturability, Yield improvement, Design for manufacturing, Chemical mechanical planarization, Semiconducting wafers, Particles, Field effect transistors

Proceedings Article | 5 May 2005 Paper
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, SRAF, Computer aided design, Resolution enhancement technologies, Design for manufacturability, Design for manufacturing, Instrument modeling, Capacitance

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, SRAF, Resolution enhancement technologies, Computer aided design, Design for manufacturing, Design for manufacturability, Instrument modeling, Lithography

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Inspection, Photomasks, Optical proximity correction, Quartz, Phase shifts, Binary data, Bridges, Etching, Reticles, Lithography

Showing 5 of 12 publications
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