Dr. Nitesh Pandey
at ASML
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 12 December 2023 Poster + Paper
Nitesh Pandey, Stefan Hunsche, Adam Lyons, Christoph Hennerkes, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Renzo Capelli, Werner Gillijns, Balakumar Baskaran, Joost Bekaert
Proceedings Volume PC12751, PC127510Z (2023) https://doi.org/10.1117/12.2688109
KEYWORDS: Calibration, Metrology, Scanning electron microscopy, Data modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Computational lithography, Design, Optical proximity correction

Proceedings Article | 1 December 2022 Poster + Paper
N. Pandey, S. Hunsche, A. Lyons, J. Chen, R. la Greca, R. Capelli, G. Kersteen
Proceedings Volume 12293, 122930R (2022) https://doi.org/10.1117/12.2641724
KEYWORDS: Photomasks, Calibration, 3D modeling, Data modeling, Metrology, Optical proximity correction, SRAF, Semiconducting wafers, Reticles, Critical dimension metrology

Proceedings Article | 26 May 2022 Presentation + Paper
C. Messinis, T. T. van Schaijk, N. Pandey, V. Tenner, A. Koolen, S. Witte, J. de Boer, A. den Boef
Proceedings Volume 12053, 120530B (2022) https://doi.org/10.1117/12.2604201
KEYWORDS: Overlay metrology, Digital holography, Diffraction, Sensors, Infrared radiation, Diffraction gratings, Holography, Visible radiation, Cameras, Image sensors

SPIE Journal Paper | 14 February 2022
Theodorus T. van Schaijk, Christos Messinis, Nitesh Pandey, Armand Koolen, Stefan Witte, Johannes de Boer, Arie Den Boef
JM3, Vol. 21, Issue 01, 014001, (February 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.014001
KEYWORDS: Overlay metrology, Sensors, Infrared radiation, Visible radiation, Cameras, Holograms, Digital holography, Infrared sensors, Semiconducting wafers, Infrared imaging

Proceedings Article | 20 June 2021 Presentation + Paper
T. T. M. van Schaijk, C. Messinis, N. Pandey, V. T. Tenner, A. Koolen, S. Witte, J. F. de Boer, A. J. den Boef
Proceedings Volume 11782, 117820O (2021) https://doi.org/10.1117/12.2591989
KEYWORDS: Overlay metrology, Digital holography, Diffraction, Microscopy, Holography, Diffraction gratings, Metrology, Process control, Optical lithography, Inspection

Showing 5 of 10 publications
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