Nobutaka Kikuiri
Director at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Optical resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Light sources, Lithographic illumination, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement

Proceedings Article | 16 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement, Signal detection

Showing 5 of 19 publications
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