Mr. Nobutaka Magome Profile

Nobutaka Magome

Sr. V.P. at Nikon Research Corp of America

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Author

Publications (19)

SPIE Journal Paper | 5 August 2014 Open Access

Optical displacement metrology using alternating direction Moire

Kyoichi Suwa, Koji Kaise, Hiroki Tateno, Nobutaka Magome

OE, Vol. 53, Issue 08, 084101, (August 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.8.084101

KEYWORDS: Moire patterns, Metrology, Semiconducting wafers, Photoresist materials, Distance measurement, Photomasks, Sensors, Wafer-level optics, Image registration, Error analysis

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Proceedings Article | 16 March 2009 Paper

Achieving overlay budgets for double patterning

Andrew Hazelton, Nobutaka Magome, Shinji Wakamoto, Akira Tokui, Céline Lapeyre, Sébastien Barnola, Guillaume Jullien, Vincent Salvetat

Proceedings Volume 7274, 72740X (2009) https://doi.org/10.1117/12.813599

KEYWORDS: Double patterning technology, Optical alignment, Semiconducting wafers, Optical lithography, Distortion, Etching, Overlay metrology, Lithography, Reticles, Logic

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Proceedings Article | 16 March 2009 Paper

Impact of CD and overlay errors on double-patterning processes

Céline Lapeyre, Sébastien Barnola, Isabelle Servin, Stéphanie Gaugirana, Vincent Salvetat, Nobutaka Magome, Andrew Hazelton, Martin McCallum

Proceedings Volume 7274, 72740W (2009) https://doi.org/10.1117/12.814165

KEYWORDS: Double patterning technology, Etching, Semiconducting wafers, Lithography, Photomasks, Image processing, Photoresist processing, Reticles, Line width roughness, Overlay metrology

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SPIE Journal Paper | 1 January 2009

Double-patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

JM3, Vol. 8, Issue 01, 011003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023077

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

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Proceedings Article | 4 December 2008 Paper

Exposure tool for 32-nm lithography: requirements and development progress

Andrew Hazelton, Jun Ishikawa, Nobutaka Magome

Proceedings Volume 7140, 714028 (2008) https://doi.org/10.1117/12.804647

KEYWORDS: Double patterning technology, Reticles, Semiconducting wafers, Lithography, Etching, Photomasks, Distortion, Photoresist processing, Interferometers, Logic

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Proceedings Article | 7 March 2008 Paper

Recent performance results of Nikon immersion lithography tools

Andrew Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, Hiroyuki Suzuki

Proceedings Volume 6924, 69241N (2008) https://doi.org/10.1117/12.771823

KEYWORDS: Semiconducting wafers, Calibration, Immersion lithography, Sensors, Scanners, Critical dimension metrology, Lens design, Manufacturing, Imaging systems, Control systems

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Proceedings Article | 7 March 2008 Paper

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

Proceedings Volume 6924, 69240R (2008) https://doi.org/10.1117/12.771914

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Optical lithography, Deposition processes

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Proceedings Article | 24 March 2006 Paper

Overlay improvement by using new framework of grid compensation for matching

Ayako Sukegawa, Shinji Wakamoto, Shinichi Nakajima, Masaharu Kawakubo, Nobutaka Magome

Proceedings Volume 6152, 61523A (2006) https://doi.org/10.1117/12.656876

KEYWORDS: Semiconducting wafers, Overlay metrology, Distortion, Optical alignment, Lithography, Data processing, Semiconductor manufacturing, Thermal effects, Control systems, Data modeling

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Proceedings Article | 12 May 2005 Paper

Development of aerial image based aberration measurement technique

Tsuneyuki Hagiwara, Naoto Kondo, Irihama Hiroshi, Kosuke Suzuki, Nobutaka Magome

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599317

KEYWORDS: Scanners, Image sensors, Wavefronts, Zernike polynomials, Deep ultraviolet, Artificial intelligence, Zinc, Wave propagation, Condition numbers, Lithography

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Proceedings Article | 28 May 2004 Paper

TTR (through the reticle) alignment system with photoresist ablation technique

Ryo Tanaka, Mitsuru Kobayashi, Masahiko Yasuda, Nobutaka Magome, Kazuhiko Ishigo, Hiroshi Ikegami, Tatsuhiko Higashiki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544231

KEYWORDS: Optical alignment, Semiconducting wafers, Laser ablation, Reticles, Opacity, Signal detection, Absorption, Silicon, Q switching, YAG lasers

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Proceedings Article | 26 June 2003 Paper

Outlier rejection with mixture models in alignment

Shinichi Nakajima, Yuho Kanaya, Mengling Li, Taro Sugihara, Ayako Sukegawa, Nobutaka Magome

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485385

KEYWORDS: Expectation maximization algorithms, Statistical analysis, Optical alignment, Computer simulations, Particles, Semiconducting wafers, Neodymium, Lithography, Distortion, Visibility

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Proceedings Article | 22 January 2001 Paper

New concept photomask repeater with stitching exposure technique

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410713

KEYWORDS: Reticles, Photomasks, Manufacturing, Critical dimension metrology, System on a chip, Optical lithography, Terbium, Optical alignment, Semiconducting wafers, Optical proximity correction

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Proceedings Article | 22 January 2001 Paper

Management of pattern generation system based on i-line stepper

Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410728

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Opacity, Optical proximity correction, Optical lithography, Error analysis, Inspection, Chromium

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Proceedings Article | 19 July 2000 Paper

New photomask pattern generation method based on i-line stepper

Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392096

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, System on a chip, Lithography, Printing, Kinematics, Scanning electron microscopy, Process engineering

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Proceedings Article | 19 July 2000 Paper

New-concept i-line stepper for mask fabrication

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392077

KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Manufacturing, System on a chip, Optical proximity correction, Mask making, Semiconducting wafers, Digital signal processing, Fabrication

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Proceedings Article | 5 July 2000 Paper

New pattern generation system based on i-line stepper: photomask repeater

Suigen Kyoh, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Nobutaka Magome

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389056

KEYWORDS: Photomasks, Critical dimension metrology, System on a chip, Semiconducting wafers, Lithography, Kinematics, Optical lithography, Printing, Optical components, Optical filters

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Proceedings Article | 26 May 1995 Paper

Total overlay analysis for designing future aligner

Nobutaka Magome, Hidemi Kawai

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209316

KEYWORDS: Overlay metrology, Semiconducting wafers, Reticles, Error analysis, Distortion, Semiconductors, Received signal strength, Optical alignment, Sensors, Image registration

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Proceedings Article | 1 June 1992 Paper

New imaging technique for 64M-DRAM

Naomasa Shiraishi, Shigeru Hirukawa, Yuichiro Takeuchi, Nobutaka Magome

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130364

KEYWORDS: Reticles, Semiconducting wafers, Phase shifts, Wafer-level optics, Image resolution, Optical lithography, Aluminum, Computer simulations, Diffraction, Fourier transforms

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Proceedings Article | 1 July 1991 Paper

New alignment sensors for wafer stepper

Kazuya Ota, Nobutaka Magome, Kenji Nishi

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44790

KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Photoresist materials, Spatial frequencies, Metals, Bragg cells, Light sources, Interferometry, Heterodyning

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Showing 5 of 19 publications

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