Nolwenn Baron
PhD Student at FEMTO-ST
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 19 January 2006 Paper
Baron N., V. Guicheret-Retel, J.-R. Coudevylle, G. Cabodevila, Ch. Lexcellent
Proceedings Volume 6036, 60360Q (2006) https://doi.org/10.1117/12.638468
KEYWORDS: Skin, Silicon, Data modeling, Deep reactive ion etching, Numerical simulations, Microfabrication, Semiconducting wafers, Aluminum, Ions, Etching

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