Noriaki Nakayamada
Senior Technology Expert at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 24 February 2021 Presentation
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Optical design, Modulation, Scattering, Glasses, Laser scattering, Distortion, Data processing, Photomasks, Forward error correction, Photoresist processing

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Data modeling, Image processing, Digital filtering, Image analysis, Image registration, Scanning electron microscopy, Image quality, Image filtering, Image classification, Solid modeling

Proceedings Article | 20 September 2020 Poster + Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Electron beams, Diffusion, Photomasks, Statistical modeling, Vestigial sideband modulation

Proceedings Article | 25 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Electronics, Data modeling, Image segmentation, Image processing, Manufacturing, Scanning electron microscopy, Neural networks, Photomasks, Computer aided design, Network architectures

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Point spread functions, Manufacturing, Photomasks, Extreme ultraviolet, SRAF, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 31 publications
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