Dr. Norio Kimura
at EBARA Corp Precision Machinery Co
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 16 September 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Particles, Scanning electron microscopy, Defect inspection, Defect detection, Image enhancement, Semiconducting wafers, Sensors

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Inspection, Signal to noise ratio, Extreme ultraviolet, Particles, Photomasks, Performance modeling, Scanning electron microscopy, Defect detection, Image acquisition, Systems modeling

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Inspection, Extreme ultraviolet, Particles, Signal to noise ratio, Optical inspection, Scanning electron microscopy, Sensors, Image quality, Image acquisition, Electron microscopes

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Inspection, Extreme ultraviolet, Prototyping, Particles, Photomasks, Optical inspection, Defect inspection, Defect detection, Electron microscopes, Scanning electron microscopy

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Phase shifts, Lithography, Electron beams, Electron beam lithography, Error analysis, Distortion, Overlay metrology, Optical alignment, Roads

Showing 5 of 8 publications
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