Dr. Obert R. Wood
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (95)

Proceedings Article | 9 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Principal component analysis, Detection and tracking algorithms, Imaging systems, Wavefronts, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 17 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

Proceedings Article | 27 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

SPIE Journal Paper | 30 October 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators

Showing 5 of 95 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 23 April 2015

SPIE Conference Volume | 25 April 2014

SPIE Conference Volume | 26 April 2013

SPIE Conference Volume | 26 April 2012

Conference Committee Involvement (12)
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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