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Ofir Gan
at Micron Israel
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Publications (1)
Proceedings Article | 15 February 2012 Paper
Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications
Proc. SPIE. 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
KEYWORDS: Lithography, Data modeling, Calibration, Etching, Silicon, Manufacturing, Photoresist materials, Transmittance, Photomasks, Semiconducting wafers
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