Dr. Oleg V. Khodykin Profile

Dr. Oleg V. Khodykin

at KLA-Tencor Corp

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 8 April 2011 Paper

Paper

Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

J. Sporre, R. Lofgren, D. Ruzic, O. Khodykin, D. Myers

Proceedings Volume 7969, 796929 (2011) https://doi.org/10.1117/12.881634

KEYWORDS: Tin, Etching, Plasma, Hydrogen, Extreme ultraviolet, Ions, Extreme ultraviolet lithography, Silicon, Lithography, Temperature metrology

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Proceedings Article | 7 April 2011 Paper

Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 23 March 2010 Paper

Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan, David Brandt

Proceedings Volume 7636, 763639 (2010) https://doi.org/10.1117/12.848408

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon dioxide lasers, Reflectivity, Tin, Plasma, Manufacturing, Mirrors, Ions, Light sources

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Proceedings Article | 20 March 2010 Paper

Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan

Proceedings Volume 7636, 76361I (2010) https://doi.org/10.1117/12.848404

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Manufacturing, Prototyping, Tin, Mirrors, Laser scanners

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SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3, Vol. 8, Issue 04, 041504, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224942

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, David Brandt, Alexander Bykanov, Alex Ershov, William Partlo, Dave Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727138 (2009) https://doi.org/10.1117/12.814272

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Extreme ultraviolet lithography, Sensors, Carbon dioxide lasers, Mirrors, Tin, Coating, Light sources

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Proceedings Article | 18 March 2009 Open Access

Open Access

Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727103 (2009) https://doi.org/10.1117/12.814228

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Mirrors, Tin, Plasma, Coating, Scanners, Manufacturing, Light sources

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Proceedings Article | 4 December 2008 Paper

Paper

Laser-produced plasma source system development

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7140, 71401E (2008) https://doi.org/10.1117/12.806648

KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Mirrors, Extreme ultraviolet lithography, Tin, Plasma systems, Manufacturing, Light sources, Carbon dioxide lasers

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

Proceedings Article | 3 September 2008 Paper

Paper

Enhanced reflectivity and stability of high-temperature LPP collector mirrors

Torsten Feigl, Sergiy Yulin, Marco Perske, Hagen Pauer, Mark Schürmann, Norbert Kaiser, Norbert Böwering, Oleg Khodykin, Igor Fomenkov, David Brandt

Proceedings Volume 7077, 70771W (2008) https://doi.org/10.1117/12.802322

KEYWORDS: Reflectivity, Mirrors, Coating, Extreme ultraviolet, Multilayers, Silicon, Molybdenum, Annealing, Interfaces, Plasma

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SPIE Journal Paper | 1 April 2007

Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications

Martin Neumann, Reece DeFrees, Huatan Qiu, David Ruzic, Oleg Khodykin, Alexander Ershov, Robert Bristol

JM3, Vol. 6, Issue 02, 023005, (April 2007) https://doi.org/10.1117/12.10.1117/1.2750651

KEYWORDS: Plasma, Lithium, Mirrors, EUV optics, Extreme ultraviolet, Extreme ultraviolet lithography, Ions, Sputter deposition, Reflectivity, Optics manufacturing

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Proceedings Article | 21 March 2007 Paper

Paper

Laser-produced plasma source system development

Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65173J (2007) https://doi.org/10.1117/12.713454

KEYWORDS: Extreme ultraviolet, Ions, Gas lasers, Plasma, Tin, Spectroscopy, Carbon monoxide, Extreme ultraviolet lithography, Calibration, Sensors

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This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the droplets. Liquid tin is the material of choice to be used as a target due to the relatively high CE of the laser energy into in-band EUV radiation. Results obtained with the droplet generator and technical challenges related to successful implementation of the device are discussed.

Proceedings Article | 19 March 2007 Paper

Paper

LPP EUV source development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65170Q (2007) https://doi.org/10.1117/12.713279

KEYWORDS: Extreme ultraviolet, Gas lasers, Plasmas, Tin, Mirrors, Reflectivity, Extreme ultraviolet lithography, Carbon monoxide, Ions, Scanners

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Proceedings Article | 18 January 2007 Paper

Paper

Active cleaning for lithium-coated optics for HVM EUV systems

M. Neumann, E. Ritz, R. Defrees, M. Cruce, H. Qiu, D. Ruzic, R. Bristol, A. Ershov, O. Khodykin

Proceedings Volume 6151, 615132 (2007) https://doi.org/10.1117/12.656614

KEYWORDS: Lithium, Plasma, EUV optics, Sputter deposition, Extreme ultraviolet, Mirrors, Ions, Surface roughness, Atomic force microscopy, Optics manufacturing

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Proceedings Article | 24 March 2006 Paper

Paper

High-temperature LPP collector mirror

Torsten Feigl, Sergiy Yulin, Nicolas Benoit, Norbert Kaiser, Norbert Böwering, Alex Ershov, Oleh Khodykin, John Viatella, Kent Bruzzone, Igor Fomenkov, David Myers

Proceedings Volume 6151, 61514A (2006) https://doi.org/10.1117/12.662138

KEYWORDS: Mirrors, Reflectivity, Multilayers, Coating, Extreme ultraviolet, Silicon, Annealing, Atomic force microscopy, Silicon carbide, Temperature metrology

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Proceedings Article | 24 March 2006 Paper

Paper

EUV source collector

Norbert Böwering, Alex Ershov, William Marx, Oleh Khodykin, Björn Hansson, Ernesto Vargas L., Juan Chavez, Igor Fomenkov, David Myers, David Brandt

Proceedings Volume 6151, 61513R (2006) https://doi.org/10.1117/12.656462

KEYWORDS: Mirrors, Extreme ultraviolet, Coating, Reflectivity, Multilayers, Plasma, Tin, Solids, Light sources, Atomic force microscopy

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Proceedings Article | 24 March 2006 Paper

Paper

High-power low cost drive laser for LPP source

Igor Fomenkov, Björn Hansson, Norbert Böwering, Alex Ershov, William Partlo, Vladimir Fleurov, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas L., Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61513X (2006) https://doi.org/10.1117/12.655733

KEYWORDS: Gas lasers, Molybdenum, Carbon monoxide, Optical amplifiers, Laser applications, Neodymium lasers, Oscillators, Extreme ultraviolet, Excimer lasers, High power lasers

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We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP) EUV source. Cymer has conducted research on a number of solutions for a multi-kW drive laser system that satisfy high volume production requirements. Types of lasers to be presented include XeF at 351 nm and CO₂ at 10.6 micron. We report on a high efficiency XeF amplifier with a 3rd harmonic Nd:YLF master oscillator operated in the 6 to 8 kHz range and a CO₂ laser system with Q-switched cavity dumped master oscillator and RF pumped fast axial flow amplifiers operated in the 10 to 100 kHz range. CO₂ laser short pulse gain and optical isolation techniques are reported. Optical performance data and design features of the drive laser system are discussed, as well as a path to achieve output power scaling to meet high volume manufacturing (HVM) requirements and beyond. Additionally, the electrical efficiency as a component of cost of operation is presented. Development of a drive laser with sufficient output power, high beam quality, and economical cost of operation is critical to the successful implementation of a laser-produced-plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system with two gas-discharge power amplifiers to produce high output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet HVM requirements. Development of a drive laser for LPP EUV source is a challenging task. It requires multi-kW laser output power with short pulse duration and diffraction limited beam quality. In addition, this system needs to be very reliable and cost-efficient to satisfy industry requirements for high volume integrated circuit manufacturing. Feasibility studies of high power laser solutions that utilize proven laser technologies in high power optical gain modules and deliver required beam properties have been performed and are reported.

Proceedings Article | 23 March 2006 Paper

Paper

LPP EUV source development for HVM

Björn Hansson, Igor Fomenkov, Norbert Böwering, Alex Ershov, William Partlo, David Myers, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas, Rod Simmons, Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61510R (2006) https://doi.org/10.1117/12.656687

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Lithium, Extreme ultraviolet lithography, Mirrors, Ions, Prototyping, Reflectivity, Metrology

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Proceedings Article | 10 May 2005 Paper

Paper

Metrology of laser-produced plasma light source for EUV lithography

N. Boewering, J. Hoffman, O. Khodykin, C. Rettig, B. Hansson, A. Ershov, I. Fomenkov

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600809

KEYWORDS: Extreme ultraviolet, Plasma, Metrology, Mirrors, Sensors, Tin, Optical filters, Spectroscopy, Lithium, Photodiodes

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Proceedings Article | 6 May 2005 Paper

Paper

LPP EUV conversion efficiency optimization

J. Hoffman, A. Bykanov, O. Khodykin, A. Ershov, I. Fomenkov, W. Partlo, D. Myers

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601048

KEYWORDS: Tin, Extreme ultraviolet, Lithium, Plasma, Pulsed laser operation, Laser energy, Spectroscopy, Light, CCD cameras, Image analysis

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Proceedings Article | 6 May 2005 Paper

Paper

Protection of collector optics in an LPP based EUV source

C. Rettig, O. Khodykin, J. Hoffman, W. Marx, N. Bowering, E. Vargas, A. Ershov, I. Fomenkov, W. Partlo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601517

KEYWORDS: Ions, Lithium, Mirrors, Extreme ultraviolet lithography, Reflectivity, Plasma, Extreme ultraviolet, EUV optics, Tin, Diffusion

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Proceedings Article | 20 May 2004 Paper

Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538690

KEYWORDS: Electrodes, Plasma, Extreme ultraviolet, Xenon, Tin, Light sources, Extreme ultraviolet lithography, Magnetism, Carbon, Contamination

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Proceedings Article | 16 June 2003 Paper

Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Bowering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.505303

KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Light sources, Extreme ultraviolet lithography, Mirrors, Zirconium, Lithography, Metrology

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Proceedings Article | 1 July 2002 Paper

Paper

Optimization of a dense plasma focus device as a light source for EUV lithography

Igor Fomenkov, William Partlo, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472339

KEYWORDS: Extreme ultraviolet, Xenon, Electrodes, Plasma, Photodiodes, Mirrors, Light sources, Extreme ultraviolet lithography, Pulsed power, Capacitors

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Since the initial demonstration of EUV emission with Xenon as a source gas in Cymer's Dense Plasma Focus (DPF) device, significant effort has been spent exploring the parameter space for optimization of efficient generation of EUV radiation. Parameters included in this investigation are He and Xe pressure and flow rates, electrode geometries, pre-ionization characteristics, and duty factor related performance issues. In these investigations it was found that the location of the He (buffer gas) and Xe (working gas) gas injection ports as well as the pressures and flow rates of the gas mixture components had a strong impact on EUV emission efficiency. Additional constraints on the gas recipe are also derived from gas absorption of the EUV radiation and the desire to provide debris mitigation properties. Best results to date have been obtained with an axially symmetric buffer gas injection scheme coupled with axial Xe injection through the central electrode. The highest conversion efficiency obtained was 0.42 percent at 12.4 J of input energy. Measurements of energy stability show a 10 percent standard deviation at near optimum EUV output. The matching of the drive circuit to the pinch as determined by the damping of the voltage overshoot waveforms was found to depend strongly on the He and Xe pressures. Energy Dispersive X-Ray (EDX) analysis of the debris emitted from the source shows that the primary sources of the debris are the central electrode and the insulator. No evidence of cathode material has been found. In addition to efforts toward more efficient operation, first phase efforts of thermal engineering have been undertaken, which have led to continuous operation at 200 Hertz with conventional direct water cooling. The system can be operated at higher repetition rates with proportionally lower duty cycles. The data will show the distribution of thermal power throughout the whole system. This more detailed understanding of the thermal power flow allows us to better determine the ultimate high volume manufacturing potential of this source technology.

Proceedings Article | 22 November 1999 Paper

Paper

Photochromic organic material based on an electronc transfer reaction

Stephan Zilker, Oleh Khodykin, B. Kharlamov, Dietrich Haarer

Proceedings Volume 3802, (1999) https://doi.org/10.1117/12.370234

KEYWORDS: Absorption, Refractive index, Polymethylmethacrylate, Organic materials, Quantum efficiency, Absorbance, Chromophores, Solids, Polymers, Molecules

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Showing 5 of 25 publications

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