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Olivier Os de Sagazan
PhD at STMicroelectronics
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Publications (1)
Proceedings Article | 1 July 2005 Paper
Amorphous Si deposition method thanks traditional PECVD insulator equipments for seed layers performing
O. De Sagazan, E. Prodhome, D. Gaudin, M. Denoual, P. Guil, O. Bonnaud
Proceedings Volume 5836, (2005) https://doi.org/10.1117/12.608282
KEYWORDS: Silicon, Plasma enhanced chemical vapor deposition, Actuators, Low pressure chemical vapor deposition, Semiconducting wafers, Plasma, Microelectromechanical systems, Electrodes, Deposition processes, Oxides
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