Dr. Oscar Noordman
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mirrors, Diffractive optical elements, Polarization, Imaging systems, Electroluminescence, Photomasks, Source mask optimization, Semiconducting wafers, Light, Fiber optic illuminators

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mirrors, Reticles, Lithographic illumination, Diffractive optical elements, Manufacturing, Distortion, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Mirrors, Metrology, Switching, Diffractive optical elements, Scanners, Micromirrors, Source mask optimization, Semiconducting wafers, Light, Fiber optic illuminators

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Speckle, Speckle pattern, Line width roughness, Reticles, Optical lithography, Semiconducting wafers, Temporal coherence, Pulsed laser operation, Spatial coherence, Spatial frequencies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Temporal coherence, Reticles, Optical lithography, Spatial frequencies, Speckle, Speckle pattern, Line width roughness, Spatial coherence, Semiconducting wafers, Pulsed laser operation

Showing 5 of 11 publications
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