Dr. Paolo Zambon
Scientist
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Energy efficiency, Light sources, Optical amplifiers, Optical lithography, Oscillators, Control systems, Excimers, Molybdenum, Acoustics

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Manufacturing, Scanning electron microscopy, Photoresist materials, Photomasks, Excimer lasers, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Monochromatic aberrations, Interferometers, Scanners, Diagnostics, Wavefronts, Wavefront aberrations, Control systems, Photoresist materials, Excimer lasers

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Optical lithography, Laser energy, Laser processing, Laser applications, Laser scanners, Process control, Laser stabilization, 3D scanning, Process engineering

Proceedings Article | 26 July 1999 Paper
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Safety, Deep ultraviolet, Manufacturing, Reliability, Control systems, Semiconductor lasers, Laser stabilization, Excimer lasers, Laser systems engineering

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