CONFERENCE PROCEEDINGS
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Pascal Gilgenkrantz
Management Engineer at Mentor Graphics (Ireland) Ltd French Branch
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Author
Publications (4)
Proceedings Article | 3 October 2018 Presentation + Paper
Extending mask data preparation to scale to thousands of CPUs and beyond
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Computing systems, Data processing, Distributed computing, Optical proximity correction, Data communications, Data storage servers
Proceedings Article | 19 September 2018 Paper
Maximizing utilization of large-scale mask data preparation clusters
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Visualization, Manufacturing, Photomasks, Optical proximity correction, Operating systems, Electronic design automation, Network architectures
Proceedings Article | 19 March 2015 Paper
Predictability and impact of product layout induced topology on across-field focus control
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Wafer-level optics, Data modeling, Sensors, Scanners, Silicon, Finite element methods, Photomasks, Convolution, Semiconducting wafers, Chemical mechanical planarization
Proceedings Article | 2 April 2011 Paper
Augmented reality for wafer prober
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Cameras, Databases, Manufacturing, Augmented reality, Photomasks, Zoom lenses, Semiconducting wafers, Wafer testing, Wafer manufacturing, Standards development
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