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Patricia Gabella
Lithography Project Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 26 May 2010 Paper
PROVE, the next generation registration metrology tool: status report
Dirk Beyer, Patricia Gabella, Greg Hughes, Gerd Klose, Norbert Rosenkranz
Proceedings Volume 7748, 77480M (2010) https://doi.org/10.1117/12.867913
KEYWORDS: Photomasks, Metrology, Image registration, 193nm lithography, Extreme ultraviolet, Lithography, Lithographic illumination, Image resolution, Pellicles, Double patterning technology
Proceedings Article | 20 October 2006 Paper
Benchmarking the productivity of photomask manufacturers
C. Neil Berglund, Charles Weber, Patricia Gabella
Proceedings Volume 6349, 634927 (2006) https://doi.org/10.1117/12.686227
KEYWORDS: Photomasks, Manufacturing, Mask making, Semiconductor manufacturing, Inspection, Semiconductors, Process control, Statistical analysis, Reliability, Clean room processes
Proceedings Article | 14 September 2001 Paper
Alternating PSM mask performance: a study of multiple fabrication technique results
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435771
KEYWORDS: Photomasks, Metrology, Etching, Reactive ion etching, Manufacturing, Reticles, Anisotropic etching, Image processing, Phase measurement, Fabrication
Proceedings Article | 21 May 1996 Paper
Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control
John Alvis, Michael Satterfield, Patricia Gabella
Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240086
KEYWORDS: Semiconducting wafers, Image filtering, Etching, Inspection, Reticles, Process control, Optical filters, Photoresist materials, Photoresist developing, Wafer-level optics
Proceedings Article | 4 August 1993 Paper
Obtaining process information from defect detection data to focus defect reduction programs in the fab environment
Patricia Gabella, Elizabeth Knowles
Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148986
KEYWORDS: Semiconducting wafers, Inspection, Cadmium, Wafer inspection, Defect detection, Data processing, Manufacturing, Environmental sensing, Wafer-level optics, Databases
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