Patrick K. Montgomery
Lithographer at Freescale Semiconductor Inc
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Optical lithography, Silicon, Inspection, Printing, Photomasks, Optical simulations, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Reticles, Metrology, Cadmium, Metals, Manufacturing, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithium, Optical lithography, Polarization, 3D modeling, Information technology, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Logic, Optical lithography, Polarization, Scanners, Printing, Transistors, Double patterning technology, Optical proximity correction, System on a chip, Resolution enhancement technologies

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Optical lithography, Etching, Chemistry, 3D modeling, Photoresist materials, Optical proximity correction, Fluorine, Photoresist processing, Semiconducting wafers

Showing 5 of 20 publications
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