Dr. Patrick J. O'Keeffe Profile

Dr. Patrick J. O'Keeffe

VP, Business Management at Cymer LLC

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Publications (4)

Proceedings Article | 27 March 2007 Paper

XLR 500i: recirculating ring ArF light source for immersion lithography

D.J. Brown, P. O'Keeffe, V. Fleurov, R. Rokitski, R. Bergstedt, I. Fomenkov, K. O'Brien, N. Farrar, W. Partlo

Proceedings Volume 6520, 652020 (2007) https://doi.org/10.1117/12.712684

KEYWORDS: Light sources, Molybdenum, Laser stabilization, Optical amplifiers, Critical dimension metrology, Pulsed laser operation, Laser applications, Lithography, Immersion lithography, Oscillators

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As Argon Fluoride (ArF) lithography moves into high volume production, ArF light sources need to meet performance requirements beyond the traditional drivers of power and bandwidth. The first key requirement is a continuous decrease in Cost of Ownership (CoO) where the industry requirement is for reduction in ArF CoO in line with the historical cost reduction demonstrated for Krypton Fluoride (KrF) light sources. A second requirement is improved light source performance stability. As CD control requirements shrink, following the ITRS roadmap, all process parameters which affect CD variation need tighter control. In the case of the light source, these include improved control of bandwidth, pulse energy stability and wavelength. In particular, CD sensitivity to exposure dose has become a serious challenge for device processing and improvements to laser pulse energy stability can contribute to significantly better dose control. To meet these performance challenges Cymer has designed a new dual chamber laser architecture. The Recirculating Ring design requires 10X less energy from the Master Oscillator (MO). This new configuration enables the MO chamber lifetime to reach that of the power amplifier chamber at around 30Bp. In addition, other optical modules in the system such as the line narrowing module experience lower light intensity, ensuring even longer optics lifetime. Furthermore, the Recirculating Ring configuration operates in much stronger saturation. MO energy instabilities are reduced by a factor of 9X when passed through the Ring. The output energy stability exhibits the characteristics of a fully saturated amplifier and pulse energy stability improvement of 1.5X is realized. This performance enables higher throughput scanner operation with enhanced dose control. The Recirculating Ring technology will be introduced on the XLR 500i, Cymer's fifth-generation dual chamber-based light source built on the production-proven XLA platform. This paper will describe the design details and performance characteristics of the new laser architecture.

Proceedings Article | 28 May 2004 Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia Maley, Vladimir Fleurov, Patrick O'Keeffe, Mary Haviland, Richard Morton, Walter Gillespie, Timothy Dyer, Bryan Moosman, Robert Poole

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

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Proceedings Article | 26 June 2003 Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 30 July 2002 Paper

Production-ready 4-kHz ArF laser for 193-nm lithography

Choonghoon Oh, Vladimir Fleurov, Thomas Hofmann, Thomas Duffey, F. Trintchouk, Patrick O'Keeffe, Peter Newman, Gerry Blumenstock

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474567

KEYWORDS: Lithography, Argon ion lasers, Control systems, Semiconductors, Semiconducting wafers, Optical lithography, Laser applications, Reliability, Yield improvement, Energy efficiency

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