Patrick Reynolds
President at Benchmark Technologies
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Publications (9)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Thin films, Reticles, Optical lithography, Calibration, Glasses, Argon ion lasers, Photoresist materials, Photomasks, Binary data, Oxidation

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Sensors, Calibration, Etching, Scanners, Process control, Semiconducting wafers, Chemical mechanical planarization, Back end of line, Front end of line

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Data modeling, Calibration, Error analysis, Scanning electron microscopy, Photoresist materials, Photomasks, Phase measurement, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Lithographic illumination, Polarization, Calibration, Polarimetry, Photoresist materials, Photomasks, Mask making, Signal detection, Fiber optic illuminators

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Data modeling, Calibration, Matrices, Scanners, Image analysis, Photoresist materials, Semiconducting wafers

Showing 5 of 9 publications
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