Dr. Paul C. Allen Profile

Dr. Paul C. Allen

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Author

Publications (13)

Proceedings Article | 23 March 2020 Presentation + Paper

Extending deep-UV multi-beam laser writing for optical and EUV masks

H. Christopher Hamaker, Paul Allen

Proceedings Volume 11324, 113240N (2020) https://doi.org/10.1117/12.2551944

KEYWORDS: Printing, Photomasks, Raster graphics, Extreme ultraviolet, Data conversion, Laser optics, Data processing, Deep ultraviolet

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Proceedings Article | 15 February 2012 Paper

Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications

Ofir Gan, Paul Allen, Assia Barkai, Peter Buck, Brid Connolly, Harel Frish, Massimiliano Pindo

Proceedings Volume 8249, 82490W (2012) https://doi.org/10.1117/12.907275

KEYWORDS: Photomasks, Calibration, Lithography, Photoresist materials, Transmittance, Semiconducting wafers, Etching, Manufacturing, Data modeling, Silicon

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SPIE Journal Paper | 1 July 2007

Acousto-optic phase-mask emulation

Bryan Bolt, Paul Allen

JM3, Vol. 6, Issue 03, 033005, (July 2007) https://doi.org/10.1117/12.10.1117/1.2777158

KEYWORDS: Bragg cells, Acousto-optics, Acoustics, Photomasks, Spiral phase plates, Transducers, Phase shift keying, Optical lithography, Spatial filters, Image enhancement

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Proceedings Article | 5 November 2005 Paper

Performance of the ALTA 4700 with variable print strategy and optimized resist process

Paul Allen, H. Christopher Hamaker, Cris Morgante, Andrew Berwick, Michael White

Proceedings Volume 5992, 59920W (2005) https://doi.org/10.1117/12.633049

KEYWORDS: Critical dimension metrology, Printing, Photoresist processing, Error analysis, Composites, Calibration, Standards development, Plasma etching, Logic, Metals

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Proceedings Article | 5 November 2005 Paper

Pattern fidelity performance from next-generation DUV laser lithography on 65nm masks and wafers

Robert Kiefer, Peter Buck, Vishal Garg, Jason Hickethier, Curt Jackson, John Manfredo, Cris Morgante, Paul Allen, Michael White

Proceedings Volume 5992, 59920U (2005) https://doi.org/10.1117/12.632227

KEYWORDS: Photomasks, Deep ultraviolet, Artificial intelligence, Printing, Metals, Lithography, Semiconducting wafers, Bragg cells, Evolutionary algorithms, Optical alignment

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Proceedings Article | 28 June 2005 Paper

Print characterization of photomasks from next-generation deep-ultra-violet laser pattern generator

Curt Jackson, Robert Kiefer, Peter Buck, David Mellenthin, John Manfredo, Vishal Garg, Jason Hickethier, Sarah Cohen, Cris Morgante, Paul Allen, Eric Christenson, Michael White

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617524

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Printing, Objectives, Diffractive optical elements, Bragg cells, Vestigial sideband modulation, Image enhancement, Optical proximity correction

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Proceedings Article | 16 June 2005 Paper

ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Paul Allen, Mike Bohan, Eric Christenson, H. Dai, M. Duane, H. Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637280

KEYWORDS: Semiconducting wafers, Photomasks, Metals, Reticles, Deep ultraviolet, Optical proximity correction, Manufacturing, Electron beam lithography, Lithography, Control systems

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Proceedings Article | 12 May 2005 Paper

Enhancement of the image fidelity and pattern accuracy of a DUV laser generated photomask through next-generation hardware

Robert Kiefer, Curt Jackson, Vishal Garg, David Mellenthin, John Manfredo, Peter Buck, Sarah Cohen, Cris Morgante, Paul Allen, Michael White

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600368

KEYWORDS: Photomasks, Deep ultraviolet, Image enhancement, Objectives, Diffractive optical elements, Bragg cells, Optical proximity correction, Metals, Optical lithography, Control systems

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Proceedings Article | 6 December 2004 Paper

Next-generation DUV ALTA mask patterning capabilities

Paul Allen, Michael Bohan, Eric Christenson, H. Christopher Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White, Michael Ungureit, Alan Wickstrom, Robert Kiefer, Curt Jackson

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570291

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Reticles, Lithography, Vestigial sideband modulation, Signal detection, Artificial intelligence, Servomechanisms, Mirrors

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Proceedings Article | 20 August 2004 Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II

Michael Ungureit, Samuel Howells, T. Chabreck, J. Hubbard, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Andrew Berwick, B. Skyborg, Paul Allen, Cris Morgante, Michael White

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557806

KEYWORDS: Artificial intelligence, Image enhancement, Evolutionary algorithms, Vestigial sideband modulation, Photomasks, Optical proximity correction, Deep ultraviolet, Scanning electron microscopy, Metals, Field programmable gate arrays

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Proceedings Article | 17 December 2003 Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity

Paul Allen, Alex Buxbaum, Samuel Howells, Boaz Kenan, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Michael White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518218

KEYWORDS: Artificial intelligence, Image enhancement, Photomasks, Vestigial sideband modulation, Scanning electron microscopy, Optical proximity correction, Deep ultraviolet, Evolutionary algorithms, Manufacturing, Data conversion

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Proceedings Article | 29 June 1998 Paper

Laser pattern-generation technology below 0.25 um

Paul Allen

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310774

KEYWORDS: Laser applications, Pulsed laser operation, Second-harmonic generation, Bragg cells, Signal detection, Photomasks, Modulation, Deep ultraviolet, Nonlinear optical materials, Semiconducting wafers

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Proceedings Article | 1 June 1990 Paper

Resolution performance of a 0.60-NA, 364-nm laser direct writer

Paul Allen, Peter Buck

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20200

KEYWORDS: Printing, Optical lithography, Semiconducting wafers, Sensors, Gaussian beams, Photoresist materials, Photomasks, Optical alignment, Mirrors, Calibration

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Showing 5 of 13 publications

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