Mr. Paul F. Michaloski Profile

Paul F. Michaloski

Senior Engineering Associate, Optical Design at Corning Advanced Optics

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 21 June 2019 Paper

Polarization metrology for high numerical aperture DUV objectives

Robert Grejda, Paul Michaloski, Duncan Spaulding, Stephen Mack, Robert Michaels, Paul Dewa, David Aronstein

Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII

KEYWORDS: Deep ultraviolet, Silica, Polarization, Birefringence, Sensors, Crystals, Polarimetry, Objectives, Thin film coatings, Nanolithography

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Proceedings Article | 21 September 2011 Paper

A laser speckle reduction system

Joshua Cobb, Paul Michaloski

Proc. SPIE. 8170, Illumination Optics II

KEYWORDS: Microelectromechanical systems, Mirrors, Beam splitters, Speckle, Interferometers, Cameras, Wavefronts, Speckle pattern, Collimation, Diffusers

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Proceedings Article | 9 September 2010 Paper

IODC 2010 illumination design problem

Roland Winston, Narkis Shatz, Josh Cobb, Paul Michaloski, Vladimir Oliker

Proc. SPIE. 7652, International Optical Design Conference 2010

KEYWORDS: GRIN lenses, Refractive index, Mirrors, Solar concentrators, Sensors, Dielectrics, Reflectivity, Light sources and illumination, Light, Absorption

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Proceedings Article | 29 September 2004

Requirements and designs of illuminators for microlithography

Paul Michaloski

Proc. SPIE. 5525, Laser Beam Shaping V

KEYWORDS: Wafer-level optics, Lithography, Reticles, Axicons, Optical lithography, Lamps, Diffusers, Relays, Semiconducting wafers, Fiber optic illuminators

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Proceedings Article | 14 September 2001 Paper

Optical design forms for DUV and VUV microlithographic processes

James Webb, Julie Bentley, Paul Michaloski, Anthony Phillips, Ted Tienvieri

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Mirrors, Deep ultraviolet, Inspection, Reflectivity, Colorimetry, Objectives, Excimer lasers, Vacuum ultraviolet, Surface finishing, Combined lens-mirror systems

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Proceedings Article | 21 September 1998 Paper

Method of evaluating and tolerancing interferometer designs

Paul Michaloski, Andrew Kulawiec, Jon Fleig

Proc. SPIE. 3482, International Optical Design Conference 1998

KEYWORDS: Monochromatic aberrations, Optical design, Imaging systems, Interferometers, Sensors, Wavefronts, Collimators, Ray tracing, Geometrical optics, Tolerancing

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Proceedings Article | 6 December 1993 Paper

Building world-class microlithographic lens systems: optical material requirements and qualification methods

Paul DeStefano, Paul Michaloski

Proc. SPIE. 2018, Passive Materials for Optical Elements II

KEYWORDS: Optical components, Telescopes, Prisms, Silica, Cameras, Glasses, Luminescence, Refraction, Diodes, Absorption

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Proceedings Article | 8 August 1993 Paper

Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination

William Partlo, Paul Tompkins, Paul Dewa, Paul Michaloski

Proc. SPIE. 1927, Optical/Laser Microlithography

KEYWORDS: Lithography, Reticles, Axicons, Lithographic illumination, Deep ultraviolet, Imaging systems, Control systems, Critical dimension metrology, Semiconducting wafers, Prototyping

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Showing 5 of 8 publications

Conference Committee Involvement (10)

International Optical Design Conference 2021

27 June 2021 | Online Only, United States

Laser Beam Shaping XII

21 August 2011 | San Diego, California, United States

Laser Beam Shaping XI

2 August 2010 | San Diego, California, United States

Laser Beam Shaping X

3 August 2009 | San Diego, California, United States

Laser Beam Shaping IX

11 August 2008 | San Diego, California, United States

Showing 5 of 10 Conference Committees

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