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Paul H. Yick
at ASML Special Applications
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Publications (1)
Proceedings Article | 7 March 2008 Paper
Double printing through the use of ion implantation
Nandasiri Samarakone, Paul Yick, Mary Zawadzki, Sang-Jun Choi
Proceedings Volume 6924, 69242B (2008) https://doi.org/10.1117/12.774051
KEYWORDS: Line width roughness, Argon, Printing, Etching, Ion implantation, Ions, Scanning electron microscopy, Reflectivity, Optical lithography, Photoresist processing
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