Mr. Paul P. Yu Profile

Paul P. Yu

Sr. Product Marketing Manager at KLA Corp

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Author

Publications (10)

Proceedings Article | 17 October 2008 Paper

SL2+: H5 use case

Kosuke Ito, Steven Liu, Isaac Lee, Russell Dover, Paul Yu

Proceedings Volume 7122, 71223N (2008) https://doi.org/10.1117/12.802333

KEYWORDS: Inspection, Photomasks, Reticles, Sensors, Contamination, Semiconducting wafers, SRAF, Stars, Algorithm development, Defect detection

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Proceedings Article | 17 October 2008 Paper

Improving cost of ownership on KLA-Tencor wafer fab reticle inspections by implementing pixel migration via new STARlight2+ capability

Yung-Feng Cheng, Wei-Cyuan Lo, Ming-Jui Chen, Peter Huang, Chunlin Chen, Swapnajit Chakravarty, Paul Yu, Russell Dover

Proceedings Volume 7122, 71223J (2008) https://doi.org/10.1117/12.802331

KEYWORDS: Inspection, Photomasks, Reticles, Semiconducting wafers, Air contamination, Wafer inspection, Metals, Microelectronics, Data processing, Image processing

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Proceedings Article | 2 May 2008 Paper

Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR

Jean-Paul Sier, William Broadbent, Paul Yu

Proceedings Volume 6792, 67920I (2008) https://doi.org/10.1117/12.798601

KEYWORDS: Inspection, Reticles, Databases, Defect detection, SRAF, 3D modeling, Data modeling, Image transmission, Logic, Optical proximity correction

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Proceedings Article | 30 October 2007 Paper

EUV mask process development using DUV inspection system

David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees

Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators

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Proceedings Article | 25 October 2007 Paper

Inspection results for 32nm logic and sub-50nm half-pitch memory reticles using the TeraScanHR

Jean-Paul Sier, William Broadbent, Farzin Mirzaagha, Paul Yu

Proceedings Volume 6730, 67302A (2007) https://doi.org/10.1117/12.747295

KEYWORDS: Inspection, Reticles, Databases, Defect detection, SRAF, 3D modeling, Data modeling, Logic, Image transmission, Optical proximity correction

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Proceedings Article | 14 May 2007 Paper

Field results from a new die-to-database reticle inspection platform

William Broadbent, Ichiro Yokoyama, Paul Yu, Kazunori Seki, Ryohei Nomura, Heiko Schmalfuss, Jan Heumann, Jean-Paul Sier

Proceedings Volume 6607, 660714 (2007) https://doi.org/10.1117/12.728953

KEYWORDS: Reticles, Inspection, Image transmission, Image processing, Databases, SRAF, Defect detection, Sensors, Data modeling, Manufacturing

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Proceedings Article | 20 October 2006 Paper

Study of chromeless mask quartz defect detection capability for 80-nm post structure

Jerry Lu, Boster Wang, Frank Chen, Orion Wang, Jomarch Chou, Orson Lin, Jackie Cheng, Ellison Chen, Paul Yu

Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660

KEYWORDS: Inspection, Photomasks, Defect detection, Quartz, Semiconducting wafers, Reticles, Lithography, Chromium, Resolution enhancement technologies, Manufacturing

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Proceedings Article | 4 November 2005 Paper

Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

Luke T. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, Kong Son

Proceedings Volume 5992, 599207 (2005) https://doi.org/10.1117/12.632108

KEYWORDS: Inspection, Contamination, Deep ultraviolet, Ultraviolet radiation, Reticles, Photomask technology, Image resolution, Sensors, Stars, Photomasks

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Proceedings Article | 4 November 2005 Paper

Improvement in defect classification efficiency by grouping disposition for reticle inspection

Rick Lai, Luke T. Hsu, Peter Chang, C.H. Ho, Frankie Tsai, Garrett Long, Paul Yu, John Miller, Vincent Hsu, Ellison Chen

Proceedings Volume 5992, 59920B (2005) https://doi.org/10.1117/12.632095

KEYWORDS: Photomasks, Inspection, Reticles, Diffractive optical elements, Manufacturing, Optical proximity correction, Semiconductor manufacturing, Lithography, Intelligence systems, Semiconducting wafers

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Proceedings Article | 28 June 2005 Paper

Implementation of an efficient defect classification methodology for advanced reticle inspection

Paul Yu, Vincent Hsu, Ellison Chen, Rick Lai, Kong Son, Weimin Ma, Peter Chang, Jackie Chen

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617488

KEYWORDS: Inspection, Reticles, Defect detection, Photomasks, Defect inspection, Manufacturing, Process engineering, Sensors, Image processing

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Showing 5 of 10 publications

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