Pavan K. Samudrala
Scanner Application Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Overlay metrology, Semiconducting wafers, Optical alignment, Reticles, High volume manufacturing, Metrology, HVAC controls, Optimization (mathematics), Scanners, Extreme ultraviolet

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Distortion, Control systems, Scanners, Imaging systems, Photomasks, Systems modeling, Error analysis, Semiconducting wafers, Reticles, Metrology

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical alignment, Sensors, Scanners, Aluminum, Near infrared, Laser beam diagnostics

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical alignment, Overlay metrology, Scanners, Yield improvement, Lithium, Data modeling, Roads

Proceedings Article | 21 April 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconducting wafers, Overlay metrology, Deep ultraviolet, Scanners, Process control, Photomasks, Reticles, Metrology, Metals, Data modeling, Image enhancement

Showing 5 of 11 publications
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