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Pei-Ren Jeng
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 4 December 2008 Paper
Accelerating 32nm BEOL technology development by advanced wafer inspection methodology
P. R. Jeng, C. Lin, Simon Jang, M. Liang, Wallas Chen, David Tsui, Damian Chen, Henry Chen, Chris Young, Ellis Chang
Proceedings Volume 7140, 71400S (2008) https://doi.org/10.1117/12.804526
KEYWORDS: Inspection, Photomasks, Optical proximity correction, Wafer inspection, Back end of line, Library classification systems, Semiconducting wafers, Copper, Defect inspection, Semiconductor manufacturing
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