Prof. Peichen Yu Profile

Prof. Peichen Yu

SPIE Involvement:

Author

Publications (28)

Proceedings Article | 10 April 2024 Poster + Paper

Tackling data inconsistency and runtime issues in inverse lithography technology (ILT) with comparative convergence study

Po-Hsun Fang, Peichen Yu

Proceedings Volume 12954, 129541E (2024) https://doi.org/10.1117/12.3007748

KEYWORDS: Lithography, Optical proximity correction, Parallel computing, Semiconductor manufacturing, SRAF, Image processing, Light sources, Image segmentation, Image enhancement, Error analysis

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Proceedings Article | 10 April 2024 Poster + Paper

Enhancing CD-SEM accuracy with attention-boosted Noise2Noise model

Yu Okada, Hsuehli Liu, Chieh-En Lee, Chung-Hao Tien, Peichen Yu

Proceedings Volume 12955, 129552C (2024) https://doi.org/10.1117/12.3009959

KEYWORDS: Education and training, Data modeling, Performance modeling, Denoising, Signal to noise ratio, Scanning electron microscopy, Manufacturing, Critical dimension metrology

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Proceedings Article | 4 October 2023 Presentation + Paper

Metadiffuser fabricated by DUV KrF 248nm photolithography for wavefront manipulation

Hsuehli Liu, Chunyen Chou, Linchia Huang, Wilson Guo, Peichen Yu, Chunghsuan Huang, Chaujern Cheng

Proceedings Volume 12646, 1264608 (2023) https://doi.org/10.1117/12.2677996

KEYWORDS: Photoresist materials, Optical proximity correction, Design and modelling, Wavefronts, Deep ultraviolet, Spatial light modulators, Optical lithography, Simulations, Phase conjugation, Lithography

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Proceedings Article | 3 October 2023 Presentation + Paper

Intelligent reticle modification enabled large-area metalens patterning

Chun-yen Chou, Hsueh-li Liu, Lin-chia Huang, Wilson Guo, Peichen Yu, You-chia Chang, Yao-wei Huang, Jia-min Shieh

Proceedings Volume 12653, 126530H (2023) https://doi.org/10.1117/12.2685760

KEYWORDS: Critical dimension metrology, Optical proximity correction, Optical lithography, Nanostructures, Metalenses, Silicon nitride, Reticles

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Proceedings Article | 28 September 2023 Presentation

Investigation on attention-based convolutional architectures applied to optical proximity corrections

Albert Lin, Han-Chun Tung, Yen-Wei Feng, Peichen Yu

Proceedings Volume PC12655, PC126550M (2023) https://doi.org/10.1117/12.2676658

KEYWORDS: Optical proximity correction, Network architectures, Machine learning, Convolution, 3D modeling, Scanners, Reflection, Physics, Photoresist processing, Optical lithography

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Proceedings Article | 14 April 2023 Poster

Exploring quantum annealing strategies for reticle optimizations

Po-Xun Fang, Yan-Syun Chen, Jhih-Sheng Wu, Peichen Yu

Proceedings Volume 12495, 1249521 (2023) https://doi.org/10.1117/12.2669615

KEYWORDS: Reticles, Quantum annealing, Detection and tracking algorithms, Source mask optimization, Quantum modeling, Quantum communications, Mathematical optimization, Binary data, Annealing, Simulations

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Reticle modification involving model-based optical proximity correction (MB-OPC) has driven generations of advanced CMOS nodes for more than two decades and may soon be carried over by inverse lithography technology (ILT). However, the demand for computational resources for ILT reticles cannot be addressed easily but only through massive parallel computation to this date. The development of quantum computing, in particular, quantum annealing algorism (QAA) is aimed to solve optimization problems in the real world, provided that the tasks can be framed into a binary quadratic model (BQM). Moreover, QAA is potentially capable of finding the global minimum solution of an optimization problem, instead of the local minimum provided by many gradient-based approaches. As the current ILT reticles have been largely generated using gradient-based algorithms, it is of great interest to investigate the applicability of QAA for reticle optimizations. We recast the mask optimization problem into a quadratic unconstrained binary optimization (QUBO) problem by defining the Hamiltonian as the difference between the target absolute amplitude image to that of an optimized mask. The approximation is valid due to the dominated first kernel in the sum of the coherent system (SOCS) approach for the aerial image calculation. The simulations are carried out in D-wave Advantage 6 system accessed through Amazon Bracket. Due to the limited number of qubits, we restrict the reticle optimization problems to N= 25, 36, 49, and 64 variables which map to a maximal 5760 physical qubits thru Pegasus embedding. In QAA, we investigate the effects of annealing time and inter-sample correlation, as well as the pausing strategies in the annealing schedule on the probability of finding the best solution to the target mask. We also compare the problem solved by QAA followed by the classical steepest descent (SD) algorithm versus the SD algorithm only. The hybrid QAA/SD approach produces the highest probability of finding the target mask with approximately two-thirds run time reduction from the SD solver only, suggesting that QAA indeed has the potential in finding the global-minimal solution.

Proceedings Article | 3 October 2022 Poster

High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model

Hsuehli Liu, Weiping Liao, Yuteng Chen, Shengsiang Su, Tongke Lin, Jiamin Shieh, Peichen Yu, Youchia Chang

Proceedings Volume PC12195, PC1219521 (2022) https://doi.org/10.1117/12.2644847

KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Near infrared, Photoresist materials, Critical dimension metrology, Systems modeling, Semiconductors, Photoresist developing, Photomasks

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Proceedings Article | 3 October 2022 Poster

Near-infrared metalenses employing hyperuniform disordered arrangement of nanostructures

Sheng Siang Su, Ying Chu Wu, Hsueh Li Liu, Peichen Yu

Proceedings Volume PC12195, PC1219520 (2022) https://doi.org/10.1117/12.2644670

KEYWORDS: Nanostructures, Transmittance, Amorphous silicon, Silicon photonics, Silicon, Scattering, Polarizers, Photonics, Optical filters, Numerical simulations

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Proceedings Article | 1 August 2021 Poster

Distributed optical proximity correction with deep-learning lithographic model for i-line photolithography

Wei-Ping Liao, Yu-Fan Lin, Hsueh-Li Liu, Shu-De Gong, Peichen Yu, You-Chia Chang, Jia-Min Shieh, Chun-Chi Chen, Wen-Hsien Huang

Proceedings Volume 11804, 1180421 (2021) https://doi.org/10.1117/12.2593408

KEYWORDS: Optical lithography, Optical proximity correction, Lithography, Resolution enhancement technologies, Photomasks, Parallel computing, Critical dimension metrology, Algorithm development, Transistors, Semiconductors

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Proceedings Article | 7 March 2014 Paper

Impact of light management on photovoltaic characteristics of GaAs solar cells with photonic crystals and quasi-photonic crystals

Yi-Chun Lai, Tung-Ting Yang, Peichen Yu, Mu-Min Hung, Martin Charlton

Proceedings Volume 8981, 89810F (2014) https://doi.org/10.1117/12.2038889

KEYWORDS: Solar cells, Gallium arsenide, Photonic crystals, Reflectivity, Photovoltaics, Crystals, Electronics, Mirrors, Optical design, Titanium dioxide

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Proceedings Article | 25 March 2013 Paper

Efficiency enhancement of InGaN/GaN multiple quantum well solar cells using CdS quantum dots and distributed Bragg reflectors

Yu-Lin Tsai, Chien-Chung Lin, Hau-Vei Han, Hsin-Chu Chen, Kuo-Ju Chen, Wei-Chi Lai, Jin-Kong Sheu, Fang-I Lai, Peichen Yu, Hao-Chung Kuo

Proceedings Volume 8620, 86201M (2013) https://doi.org/10.1117/12.2005823

KEYWORDS: Cadmium sulfide, Solar cells, External quantum efficiency, Absorption, Photovoltaics, Ultraviolet radiation, Quantum dots, Quantum wells, Distributed Bragg reflectors, Reflectivity

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Proceedings Article | 25 March 2013 Paper

Towards high-efficiency triple-junction solar cells with bio-inspired nanostructures

Peichen Yu, H.-V. Han, T.-T. Yang, M.-M. Hung, C.-Y. Hong, Y.-L. Tsai, K.-H. Hung, T.-G. Chen, Y.-R. Wu, G.-C. Chi

Proceedings Volume 8620, 86200N (2013) https://doi.org/10.1117/12.2003380

KEYWORDS: Solar cells, Antireflective coatings, Biomimetics, Reflectivity, Stereolithography, Nanostructures, Photovoltaics, Absorption, Refractive index, Titanium dioxide

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Proceedings Article | 25 March 2013 Paper

Improve GaAs solar cells efficiency by using high-transmittance textured PDMS film

H. Han, H. Chen, C. Lin, Y. Tsai, H. Kuo, Peichen Yu

Proceedings Volume 8620, 86201V (2013) https://doi.org/10.1117/12.2003127

KEYWORDS: Solar cells, Gallium arsenide, Light scattering, External quantum efficiency, Photovoltaics, Transmittance, Silica, Reflection, Reflectivity, Applied physics

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Proceedings Article | 13 March 2012 Paper

Source optimization incorporating margin image average with conjugate gradient method

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 8326, 83261W (2012) https://doi.org/10.1117/12.916597

KEYWORDS: Image acquisition, Photomasks, Mathematical modeling, Optimization (mathematics), Electro optical modeling, Source mask optimization, Spatial frequencies, Optical lithography, Linear filtering, Resolution enhancement technologies

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Proceedings Article | 21 February 2012 Paper

Improved efficiency for nanopillar array of c-Si photovoltaic by down-conversion and anti-reflection of quantum dots

Chien-chung Lin, Hsin-Chu Chen, Hau-Vei Han, Yu-Lin Tsai, Chia-Hua Chang, Min-An Tsai, Hao-Chung Kuo, Peichen Yu

Proceedings Volume 8256, 825609 (2012) https://doi.org/10.1117/12.908514

KEYWORDS: Cadmium sulfide, Solar cells, External quantum efficiency, Ultraviolet radiation, Quantum dots, Antireflective coatings, Photovoltaics, Silicon, Quantum efficiency, Resistance

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Proceedings Article | 21 February 2012 Paper

Scattering analysis of the indium-tin-oxide (ITO) nanowhiskers on ITO film substrate for thin film solar cell

Hsiao-Wei Liu, Chia-Hua Chang, Chien Chung Lin, Peichen Yu

Proceedings Volume 8256, 82560A (2012) https://doi.org/10.1117/12.908854

KEYWORDS: Scattering, Air contamination, Mie scattering, Light scattering, Thin film solar cells, Thin films, Solar cells, Absorption, Particles, Glasses

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SPIE Journal Paper | 1 October 2011

Wavefront-based pixel inversion algorithm for generation of subresolution assist features

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

JM3, Vol. 10, Issue 04, 043014, (October 2011) https://doi.org/10.1117/12.10.1117/1.3663249

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Wavefronts, Nanoimprint lithography, Lithography, Chaos, Image segmentation, Diffraction, Resolution enhancement technologies

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Proceedings Article | 23 March 2011 Paper

Choosing objective functions for inverse lithography patterning

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7973, 79731N (2011) https://doi.org/10.1117/12.879440

KEYWORDS: Photomasks, Optical lithography, Lithography, Optical proximity correction, Photoresist materials, SRAF, Superposition, Manufacturing, Resolution enhancement technologies, Wavefronts

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Proceedings Article | 23 March 2011 Paper

Gradient-based fast source mask optimization (SMO)

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7973, 797320 (2011) https://doi.org/10.1117/12.879441

KEYWORDS: Source mask optimization, Molybdenum, Resolution enhancement technologies, Photomasks, Spatial frequencies, Lithography, Optical lithography, Image acquisition, Optical proximity correction, Photoresist materials

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Proceedings Article | 21 February 2011 Paper

Indium-tin-oxide nanowhiskers crystalline silicon photovoltaics combining micro- and nano-scale surface textures

C. H. Chang, M. H. Hsu, W. L. Chang, W. C. Sun, Peichen Yu

Proceedings Volume 7933, 79332M (2011) https://doi.org/10.1117/12.876853

KEYWORDS: Antireflective coatings, Silicon, Solar cells, Silicon solar cells, Crystals, Reflection, External quantum efficiency, Tin, Reflectivity, Scattering

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Proceedings Article | 21 February 2011 Paper

High efficiency triple-junction solar cells employing biomimetic antireflective structures

Meng-Yih Chiu, Chia-Hua Chang, Feng-Yu Chang, Peichen Yu

Proceedings Volume 7933, 79330N (2011) https://doi.org/10.1117/12.876850

KEYWORDS: Solar cells, Antireflective coatings, Biomimetics, Etching, Stereolithography, Silicon, External quantum efficiency, Photovoltaics, Reflectivity, Lithography

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Proceedings Article | 4 March 2010 Paper

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7640, 76402L (2010) https://doi.org/10.1117/12.846568

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Optimization (mathematics), Optical lithography, Integrated optics, Optics manufacturing, Integrated circuits, Semiconducting wafers, Lithographic illumination

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Proceedings Article | 12 December 2009 Paper

Fast converging inverse lithography algorithm incorporating image gradient descent methods

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7520, 75200V (2009) https://doi.org/10.1117/12.837514

KEYWORDS: Binary data, Photomasks, Optical proximity correction, Lithography, Algorithm development, Image processing, Manufacturing, Projection systems, Diffraction, Image quality

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Proceedings Article | 16 March 2009 Paper

Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 7274, 72743B (2009) https://doi.org/10.1117/12.814413

KEYWORDS: SRAF, Optical proximity correction, Wavefronts, Model-based design, Photomasks, Manufacturing, Image segmentation, Solids, Optimization (mathematics), Lithography

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Proceedings Article | 4 December 2008 Paper

Model-based sub-resolution assist features using an inverse lithography method

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 7140, 714014 (2008) https://doi.org/10.1117/12.804678

KEYWORDS: SRAF, Photomasks, Wavefronts, Optical proximity correction, Lithography, Model-based design, Image segmentation, Manufacturing, Resolution enhancement technologies, Image enhancement

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Proceedings Article | 18 November 2008 Paper

Strain relaxation characteristics of a single InGaN-based nanopillar fabricated by focused ion beam milling

Peichen Yu, Min-An Tsai, Ching-Hua Chiu, Hao-chung Kuo, Yuh-Renn Wu

Proceedings Volume 7135, 71351Y (2008) https://doi.org/10.1117/12.804065

KEYWORDS: Platinum, Ion beams, Nanolithography, Luminescence, Quantum wells, Gallium nitride, Aluminum, Polarization, Optoelectronic devices, Nanorods

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Proceedings Article | 18 November 2008 Paper

Epitaxial Lateral Overgrowth of GaN-based Light Emitting Diodes on SiO2 Nanorod-Array Patterned Sapphire Substrates by MOCVD

C. Chiu, C. Chao, M. Lo, Y. Cheng, H. Kuo, P. Yu, T. Lu, S. Wang, K. Lau

Proceedings Volume 7135, 71351Z (2008) https://doi.org/10.1117/12.804291

KEYWORDS: Light emitting diodes, Silica, Gallium nitride, Sapphire, Epitaxial lateral overgrowth, Metalorganic chemical vapor deposition, Patterned sapphire substrate, External quantum efficiency, Nickel, Nanorods

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Proceedings Article | 2 September 2008 Paper

Analysis of strain relaxation and emission spectrum of a free-standing GaN-based nanopillar

Yuh-Renn Wu, Peichen Yu, C. Chiu, Cheng-Yu Chang, H. Kuo

Proceedings Volume 7058, 70580G (2008) https://doi.org/10.1117/12.800658

KEYWORDS: Quantum wells, Polarization, Platinum, Luminescence, Ion beams, Indium gallium nitride, Nanolithography, Charge-coupled devices, Gallium nitride, Indium

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