Dr. Peng Liu Profile

Dr. Peng Liu

Synopsys Fellow at Synopsys Inc

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Author

Publications (12)

Proceedings Article | 10 April 2024 Presentation + Paper

High accuracy OPC electromagnetic full-chip modeling for curvilinear mask OPC and ILT

Enas Sakr, Zac Levinson, Rob DeLancey, C. Jay Lee, Jinguang Li, Ryan Chen, Robert Iwanow, Delian Yang, Wolfgang Hoppe, Folarin Latinwo, Kevin Lucas, Peng Liu

Proceedings Volume 12954, 129540N (2024) https://doi.org/10.1117/12.3013089

KEYWORDS: Optical proximity correction, Electromagnetism, Semiconducting wafers, Extreme ultraviolet, Cadmium, 3D mask effects, Modeling, Lithography, Computational lithography, Ranging

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Proceedings Article | 23 March 2020 Paper

Mask synthesis using machine learning software and hardware platforms

Peng Liu

Proceedings Volume 11327, 1132707 (2020) https://doi.org/10.1117/12.2551816

KEYWORDS: Photomasks, Machine learning, Lithography, Neural networks, Artificial intelligence

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Proceedings Article | 25 March 2016 Paper

A physical resist shrinkage model for full-chip lithography simulations

Peng Liu, Leiwu Zheng, Maggie Ma, Qian Zhao, Yongfa Fan, Qiang Zhang, Mu Feng, Xin Guo, Tom Wallow, Keith Gronlund, Ronald Goossens, Gary Zhang, Yenwen Lu

Proceedings Volume 9779, 97790Y (2016) https://doi.org/10.1117/12.2239243

KEYWORDS: Lithography, Computational lithography, Photoresist processing, Data modeling, Calibration, Cadmium, 3D modeling, Computer simulations, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 1 April 2013 Paper

Fast 3D thick mask model for full-chip EUVL simulations

Peng Liu, Xiaobo Xie, Wei Liu, Keith Gronlund

Proceedings Volume 8679, 86790W (2013) https://doi.org/10.1117/12.2010818

KEYWORDS: Photomasks, 3D modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Finite-difference time-domain method, Semiconducting wafers, Lithography, Optical proximity correction, Reflectivity

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Proceedings Article | 13 March 2012 Paper

A full-chip 3D computational lithography framework

Peng Liu, Zhengfan Zhang, Song Lan, Qian Zhao, Mu Feng, Hua-yu Liu, Venu Vellanki, Yen-wen Lu

Proceedings Volume 8326, 83260A (2012) https://doi.org/10.1117/12.916076

KEYWORDS: 3D modeling, Photomasks, Semiconducting wafers, Performance modeling, Diffusion, Lithography, Data modeling, Optical proximity correction, 3D image processing, Computer simulations

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Proceedings Article | 14 October 2011 Paper

Accurate prediction of 3D mask topography induced best focus variation in full-chip photolithography applications

Peng Liu

Proceedings Volume 8166, 816640 (2011) https://doi.org/10.1117/12.898783

KEYWORDS: 3D modeling, Photomasks, Diffraction, Optical proximity correction, Semiconducting wafers, Image filtering, Optical lithography, Finite-difference time-domain method, Lithography, Semiconductors

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Proceedings Article | 4 March 2010 Paper

Improving aberration control with application specific optimization using computational lithography

Jianming Zhou, Youping Zhang, Peter Engblom, Mike Hyatt, Eric Wu, Martin Snajdr, Anton deVilliers, Yuan He, Craig Hickman, Peng Liu, Dennis de Lang, Bernd Geh, Erik Byers, Scott Light

Proceedings Volume 7640, 76400K (2010) https://doi.org/10.1117/12.846697

KEYWORDS: Semiconducting wafers, Scanners, Computational lithography, Optimization (mathematics), Calibration, Finite element methods, Thermal modeling, Computer simulations, Data modeling, Critical dimension metrology

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Proceedings Article | 4 March 2010 Paper

A computational method for optimal application specific lens control in microlithography

Peng Liu, Martin Snajdr, Zhengfan Zhang, Yu Cao, Jun Ye, Youping Zhang

Proceedings Volume 7640, 76400M (2010) https://doi.org/10.1117/12.846836

KEYWORDS: Scanners, Optimization (mathematics), Critical dimension metrology, Lithography, Process control, Computer simulations, Optical lithography, Photomasks, Transform theory, Software development

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Proceedings Article | 12 March 2008 Paper

Understanding illumination effects for control of optical proximity effects (OPE)

Donis Flagello, Bernd Geh, Robert Socha, Peng Liu, Yu Cao, Roland Stas, Oliver Natt, Jörg Zimmermann

Proceedings Volume 6924, 69241U (2008) https://doi.org/10.1117/12.773632

KEYWORDS: Modulation transfer functions, Fiber optic illuminators, Optical proximity correction, Data modeling, Critical dimension metrology, Lenses, Photomasks, Optical transfer functions, Scanning laser ophthalmoscopy, Laser imaging

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Proceedings Article | 30 October 2007 Paper

Validation of a fast and accurate 3D mask model for SRAF printability analysis at 32nm node

Peng Liu, Christian Zuniga, Zhongtuan Ma, Hanying Feng

Proceedings Volume 6730, 67301R (2007) https://doi.org/10.1117/12.746704

KEYWORDS: 3D modeling, Photomasks, SRAF, Fiber optic illuminators, Semiconducting wafers, Calibration, Cadmium sulfide, Computer simulations, Fourier transforms, 3D image processing

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Proceedings Article | 26 March 2007 Paper

Fast and accurate 3D mask model for full-chip OPC and verification

Peng Liu, Yu Cao, Luoqi Chen, Guangqing Chen, Mu Feng, Jiong Jiang, Hua-yu Liu, Sungsoo Suh, Sung-Woo Lee, Sukjoo Lee

Proceedings Volume 6520, 65200R (2007) https://doi.org/10.1117/12.712171

KEYWORDS: 3D modeling, Photomasks, Data modeling, Optical proximity correction, Calibration, Binary data, Semiconducting wafers, Performance modeling, Systems modeling, Fourier transforms

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Proceedings Article | 14 May 2004 Paper

Proximity correction and k1 performance for resists with nonoptical patterning response

David Fryer, Vivek Singh, Thanh Phung, Peng Liu

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537701

KEYWORDS: Data modeling, Optical lithography, Photomasks, Interfaces, Systems modeling, Scanning electron microscopy, Oxides, Thermal effects, Optical proximity correction, Lithography

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Showing 5 of 12 publications

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