Dr. Peng Zhang
Principal Research Chemist at Air Products and Chemicals Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Manufacturing, Control systems, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Image processing, Scanners, Image resolution, Electroluminescence, Platinum, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Semiconducting wafers, Resist chemistry

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Etching, Capillaries, Manufacturing, Photomasks, Mask making, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies, Liquids

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Refractive index, Microfluidics, Water, Ultraviolet radiation, Photoresist materials, Absorbance, Immersion lithography, Semiconducting wafers, Fluid dynamics, Absorption

Showing 5 of 13 publications
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