Mr. Jong-Yuh Chang Profile

Jong-Yuh Chang

at Taiwan Semiconductor Manufacturing Co Ltd

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Author

Publications (5)

Proceedings Article | 4 December 2023 Presentation + Paper

A core engine to enable high quality multi-beam mask writers for 2nm node and beyond

Patrick P. Lee, Frankie F. Tsai, Harry C. Ku, Min-Da Cheng, Joey J. Wang, Peter J. Chang, M. Lii, Jacqueline Atanelov, Anh-Dai Dang, Samuel Kvasnica

Proceedings Volume PC12751, PC127510S (2023) https://doi.org/10.1117/12.2688300

KEYWORDS: Telecommunications, Optical proximity correction, Microelectromechanical systems, Optics manufacturing, Optical communications, Electrodes, Data communications, CMOS technology, CMOS devices

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Proceedings Article | 4 October 2016 Paper

Megasonic cleaning strategy for sub-10nm photomasks

Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, Laurent Tuo

Proceedings Volume 9985, 998515 (2016) https://doi.org/10.1117/12.2241143

KEYWORDS: SRAF, Photomasks, Cavitation, Particles, Inspection, Glasses, Plasma, Mask cleaning, Acoustics, Oxygen

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Proceedings Article | 14 October 2011 Paper

Enabling virtual wafer CD (WCD) using inverse pattern rendering (IPR) of mask CD-SEM images

Thuc Dam, Dongxue Chen, Hsien-Min Chang, Noel Corcoran, Paul Yu, Linyong Pang, Chia-Wei Chang, Rick Lai, Peter Chang, Laurent Tuo

Proceedings Volume 8166, 81660O (2011) https://doi.org/10.1117/12.896951

KEYWORDS: Scanning electron microscopy, Photomasks, Semiconducting wafers, Calibration, Critical dimension metrology, Optical proximity correction, Image processing, Signal to noise ratio, Mask making, Holons

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Proceedings Article | 4 November 2005 Paper

Improvement in defect classification efficiency by grouping disposition for reticle inspection

Rick Lai, Luke T. Hsu, Peter Chang, C.H. Ho, Frankie Tsai, Garrett Long, Paul Yu, John Miller, Vincent Hsu, Ellison Chen

Proceedings Volume 5992, 59920B (2005) https://doi.org/10.1117/12.632095

KEYWORDS: Photomasks, Inspection, Reticles, Diffractive optical elements, Manufacturing, Optical proximity correction, Semiconductor manufacturing, Lithography, Intelligence systems, Semiconducting wafers

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Proceedings Article | 28 June 2005 Paper

Implementation of an efficient defect classification methodology for advanced reticle inspection

Paul Yu, Vincent Hsu, Ellison Chen, Rick Lai, Kong Son, Weimin Ma, Peter Chang, Jackie Chen

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617488

KEYWORDS: Inspection, Reticles, Defect detection, Photomasks, Defect inspection, Manufacturing, Process engineering, Sensors, Image processing

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