Dr. Peter Hudek
Technical Director Application at IMS Nanofabrication GmbH
SPIE Involvement:
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Publications (19)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Lithography, Point spread functions, Scattering, Numerical simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Chemically amplified resists

Proceedings Article | 12 November 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

Proceedings Article | 20 October 2016 Paper
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Manufacturing, Image registration, Photomasks, Beam shaping, Nanofabrication, Model-based design

Showing 5 of 19 publications
Conference Committee Involvement (3)
ASDAM 2012 the 9th Int'l Conf. on Advanced Semiconductor Devices and Microsystems
11 November 2012 |
MNE 2012
16 September 2012 |
MNE 2011
19 September 2011 |
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