Dr. Peter Kuschnerus
at Carl Zeiss GmbH
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Electron beams, Magnesium, Opacity, Etching, Quartz, Image processing, Chromium, Signal processing, Photomasks, Binary data

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Metrology, Lithographic illumination, CCD cameras, Image quality, Photomasks, Semiconducting wafers, Binary data

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Lithographic illumination, CCD cameras, Printing, Photomasks, Charge-coupled devices, Optical alignment, Semiconducting wafers, Binary data

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, CCD cameras, Image quality, Vibration control, Optical resolution, Photomasks, Vacuum ultraviolet, CCD image sensors, Semiconducting wafers, Binary data

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Temporal coherence, Microscopes, Optical lithography, Microlens array, Speckle, Inspection, Diffusers, Microlens, Excimer lasers, Pulsed laser operation

Showing 5 of 7 publications
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