Dr. Peter Mayer Profile

Dr. Peter Mayer

EUV Source System Architect

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper

High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools

Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown

Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers

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Proceedings Article | 28 April 2023 Presentation + Paper

EUV light source for high-NA and low-NA lithography

Karl Umstadter, Matthew Graham, Michael Purvis, Alex Schafgans, Jayson Stewart, Peter Mayer, Daniel Brown

Proceedings Volume 12494, 124940Z (2023) https://doi.org/10.1117/12.2657772

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, High volume manufacturing, Plasma, Light sources, Gas lasers, Scanners, Tin, EUV optics

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Proceedings Article | 22 February 2021 Poster + Presentation

Advances toward high power EUV sources for EUVL scanners for HVM in the next decade and beyond

David Brandt, Michael Purvis, Igor Fomenkov, Daniel Brown, Alex Schafgans, Peter Mayer, Rob Rafac

Proceedings Volume 11609, 116091E (2021) https://doi.org/10.1117/12.2584413

KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Tin, Semiconductors, Laser stabilization, Laser applications, High volume manufacturing

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Proceedings Article | 22 February 2021 Presentation

Laser produced plasma EUV sources for N5 HVM and beyond: performance, availability and technology innovation

Peter Mayer, David Brandt, Igor Fomenkov, Michael Purvis, Daniel Brown

Proceedings Volume 11609, 1160918 (2021) https://doi.org/10.1117/12.2584407

KEYWORDS: Scanners, Extreme ultraviolet lithography, Tin, Extreme ultraviolet, Semiconductors, High volume manufacturing

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Proceedings Article | 22 February 2021 Poster + Presentation

Modeling Sn scattering through hydrogen using DFT potentials

Jack Stahl, Dren Qerimi, Niels Braaksma, Peter Mayer, David Brandt, David Ruzic

Proceedings Volume 11609, 116091R (2021) https://doi.org/10.1117/12.2584334

KEYWORDS: Tin, Scattering, Hydrogen, Laser scattering, Particles, Ions, Chemical species, Binary data

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Proceedings Article | 9 September 2019 Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

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Proceedings Article | 16 May 2003 Paper

Excess photon noise in semiconductor cascade lasers

Farhan Rana, Peter Mayer, Rajeev Ram

Proceedings Volume 5111, (2003) https://doi.org/10.1117/12.500877

KEYWORDS: Quantum cascade lasers, Semiconductor lasers, Semiconductors, Laser resonators, Diodes, Negative feedback, Quantum efficiency, Imaging spectroscopy, Waveguide lasers, Waveguides

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Proceedings Article | 4 December 2002 Paper

Cascade semiconductor lasers for telecommunications

Rajeev Ram, Farhan Rana, Peter Mayer, Holger Schmidt

Proceedings Volume 4871, (2002) https://doi.org/10.1117/12.457279

KEYWORDS: Quantum cascade lasers, Semiconductor lasers, Photons, Signal to noise ratio, Electrons, Interference (communication), Modulation, Quantum wells, Telecommunications, Systems modeling

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Showing 5 of 8 publications

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