Dr. Peter Mayer
EUV Source System Architect
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Scattering, Chemical species, Particles, Ions, Hydrogen, Laser scattering, Binary data, Tin

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Laser applications, Laser stabilization, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 9 September 2019 Presentation
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 16 May 2003 Paper
Proc. SPIE. 5111, Fluctuations and Noise in Photonics and Quantum Optics
KEYWORDS: Semiconductors, Waveguides, Quantum efficiency, Quantum cascade lasers, Imaging spectroscopy, Semiconductor lasers, Laser resonators, Diodes, Waveguide lasers, Negative feedback

Showing 5 of 6 publications
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