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Dr. Piotr T. Jedrasik
at Chalmers Univ of Technology
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Publications (4)
Proceedings Article | 2 April 2010 Paper
Proximity effects correction for sub-10nm patterning node
Proceedings Volume 7638, 76383B (2010) https://doi.org/10.1117/12.848337
KEYWORDS: Electron beam lithography, Scattering, Laser scattering, Electron beams, Calibration, Semiconducting wafers, Analytical research, Photoresist processing, Hydrogen, Critical dimension metrology
Proceedings Article | 18 March 2009 Paper
Proximity effect correction for 20nm dimension patterning
Dai Tsunoda, Masahiro Shoji, Mitsuko Tatsugawa, Hiroyuki Tsunoe, Yusuke Iino, Piotr Jedrasik
Proceedings Volume 7271, 72712S (2009) https://doi.org/10.1117/12.813971
KEYWORDS: Scattering, Lithography, Semiconducting wafers, Electron beam lithography, Point spread functions, Electron beam direct write lithography, Data conversion, Silicon, Molecules, Scanning electron microscopy
Proceedings Article | 26 July 1999 Paper
DOF improvement by complex pupil filtering for DUV lithography
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354398
KEYWORDS: Lithography, Photomasks, Optical filters, Deep ultraviolet, Point spread functions, Projection systems, Statistical analysis, Semiconducting wafers, Image filtering, Optical design
Proceedings Article | 25 June 1999 Paper
Proximity effects correction in real time
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351123
KEYWORDS: Transistors, Error analysis, Computer simulations, Neurons, Electron beam lithography, Scattering, Artificial neural networks, Neural networks, Point spread functions, Detection and tracking algorithms
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