Dr. Pradeep Srinivasan
at Aeva, Inc
SPIE Involvement:
Author
Profile Summary

Pradeep Srinivasan obtained a PhD in Optics from CREOL/College of Optics and Photonics at the University of Central Florida. As a part of his doctoral dissertation he designed and developed all dielectric meta-optical structures with space-variant spectral, polarization and amplitude response. Strategically introduced variations in the structural properties of resonant diffractive structures were used to tailor the optical response in the near- and far-field. The complex structures were micro fabricated using wafer level approaches enabled by a novel lithographic technique developed as part of this work. Spectrally tunable optical elements were demonstrated for applications including sensing, beam shaping, graded reflectivity laser mirrors and beam quality enhancement of broad area diode lasers. Prior to this he obtained a Masters in Electrical Engineering from the University of Cincinnati. He has coauthored 2 invited presentations and more than 20 publications in peer reviewed journals and conference proceedings and has an issued patent.
Publications (11)

Proceedings Article | 19 April 2017 Presentation
Proc. SPIE. 10106, Integrated Optics: Devices, Materials, and Technologies XXI
KEYWORDS: Detection and tracking algorithms, Sensors, Waveguides, Silicon, Refractive index, Cameras, Cladding, Spectrometers, Optical pattern recognition, Calibration

Proceedings Article | 22 February 2011 Paper
Proc. SPIE. 7919, Vertical External Cavity Surface Emitting Lasers (VECSELs)
KEYWORDS: Second-harmonic generation, Semiconductor lasers, Diodes, Reflectors, Crystals, Nonlinear crystals, Neodymium, Laser stabilization, Silicon, Light sources

SPIE Journal Paper | 1 November 2009
OE Vol. 48 Issue 11
KEYWORDS: Optical filters, Silicon, Oxides, Photonic crystals, Image filtering, Chemical elements, Spatial filters, Interference filters, Illumination engineering, Etching

Proceedings Article | 21 August 2009 Paper
Proc. SPIE. 7420, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications III
KEYWORDS: Silicon, Oxides, Photoresist materials, Optical filters, Semiconducting wafers, Chemical elements, Etching, Plasma enhanced chemical vapor deposition, Optical components, Plasma

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Photoresist materials, Analog electronics, Modulation, Photoresist developing, Photomasks, Refractive index, Optical components, Overlay metrology, Scanning electron microscopy, Electron beam lithography

Showing 5 of 11 publications
Conference Committee Involvement (3)
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
3 February 2014 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
5 February 2013 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
24 January 2012 | San Francisco, California, United States
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