Mr. Pradiptya Ghosh Profile

Pradiptya Ghosh

Director of Engg - RET, MDP and Platform at Siemens EDA

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Author

Publications (8)

Proceedings Article | 8 November 2012 Paper

OPC and verification for LELE double patterning

Kellen Arb, Chris Reid, Qiao Li, Evgueni Levine, Pradiptya Ghosh

Proceedings Volume 8522, 85221B (2012) https://doi.org/10.1117/12.979143

KEYWORDS: Optical proximity correction, Double patterning technology, Photomask technology, Current controlled current source, Lithography, Photomasks, SRAF

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Proceedings Article | 13 March 2012 Paper

Predictable turn-around time for post tape-out flow

Toshikazu Endo, Minyoung Park, Pradiptya Ghosh

Proceedings Volume 8326, 83262D (2012) https://doi.org/10.1117/12.913986

KEYWORDS: Data processing, Computer simulations, Optical proximity correction, Data modeling, Resolution enhancement technologies, SRAF, Photomasks, Control systems, Detection and tracking algorithms, Computing systems

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Proceedings Article | 13 March 2012 Paper

14nm M1 triple patterning

Qiao Li, Pradiptya Ghosh, David Abercrombie, Pat LaCour, Suniti Kanodia

Proceedings Volume 8326, 832612 (2012) https://doi.org/10.1117/12.916610

KEYWORDS: Optical lithography, Extreme ultraviolet, Current controlled current source, Double patterning technology, Optical proximity correction, Manufacturing equipment

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Proceedings Article | 14 October 2011 Paper

Double patterning from design enablement to verification

David Abercrombie, Pat Lacour, Omar El-Sewefy, Alex Volkov, Evgueni Levine, Kellen Arb, Chris Reid, Qiao Li, Pradiptya Ghosh

Proceedings Volume 8166, 81660X (2011) https://doi.org/10.1117/12.898895

KEYWORDS: Double patterning technology, Photomasks, Optical proximity correction, Manufacturing, Metals, Resolution enhancement technologies, Visualization, Semiconducting wafers, Image processing, Lithography

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Proceedings Article | 12 December 2009 Paper

Hierarchical DPT mask planning for contact layer

Qiao Li, Pradiptya Ghosh, Pat LaCour

Proceedings Volume 7520, 75201O (2009) https://doi.org/10.1117/12.837214

KEYWORDS: Photomasks, Visualization, Double patterning technology, Lithography, Design for manufacturability, Manufacturing, Acquisition tracking and pointing, Roads, Optical lithography

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Proceedings Article | 23 September 2009 Paper

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze

Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443

KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations

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Proceedings Article | 11 May 2009 Paper

Optimizing computing resources for optimal throughput in a mask data preparation flow

Weidong Zhang, Ron Bennett, Pradiptya Ghosh, Steffen Schulze, Amanda Bowhill

Proceedings Volume 7379, 73792Y (2009) https://doi.org/10.1117/12.824349

KEYWORDS: Data storage, Clocks, Data processing, Photomasks, Testing and analysis, Data modeling, Iterative methods, Visualization, Distributed computing, Information technology

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Proceedings Article | 10 July 2003 Paper

PsmLint: bringing AltPSM benefits to the IC design stage

Pradiptya Ghosh, Chung-Shin Kang, Michael Sanie, Judy Huckabay

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485253

KEYWORDS: Computer aided design, Manufacturing, Optical proximity correction, Photomasks, Optics manufacturing, Phase shifts, Integrated circuit design, Resolution enhancement technologies, Lithography, Design for manufacturability

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Showing 5 of 8 publications

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