Mr. Pranay Nath Profile

Pranay Nath

at Auburn Univ

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Proceedings Article | 16 March 2009 Paper

Arbitrary three-dimensional micro-fabrication by polymer grayscale lithography

Li Jiang, Pranay Nath, N. Korivi

Proceedings Volume 7274, 72742L (2009) https://doi.org/10.1117/12.814114

KEYWORDS: Photomasks, Polymers, Photoresist materials, Ultraviolet radiation, 3D microstructuring, Silicon, Grayscale lithography, Raman spectroscopy, Lithography, Photoresist developing

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We report on the continuing development of a grayscale lithography technique based on the use of a polymeric grayscale photomask. Arbitrary three-dimensional (3D) microstructures can be realized in positive and negative photoresist materials by the use of the polymeric grayscale photomask with standard ultra-violet (UV) lithography. The fabrication of such 3D structures depends on the differential absorption of in photo-absorbing material. The photomask is made of patterned polydimethylsiloxane (PDMS) polymer doped with a UV absorbing laser dye. The PDMS photomask contains micro-patterns made by micro-molding the PDMS on a complementary silicon master mold. By adjusting the thickness of the patterns on the polymer photomask, the dopant dye concentration in the photomask and UV exposure dose, a multitude of unique 3D microstructures can be fabricated on the substrate with desired geometries and dimensions. While the feasibility of grayscale lithography with such a polymeric mask has been reported by us earlier, this paper describes the fabrication of master mold and polymeric grayscale photomask.

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