Dr. Qizhi He
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconducting wafers, Sensors, Chemical mechanical planarization, Scanners, Back end of line, Monochromatic aberrations, Calibration, Process control, Front end of line, Etching

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Optical proximity correction, Reticles, Optical lithography, Logic devices, Scanning electron microscopy, Prototyping, Lithography, Process modeling, Transistors, Digital signal processing

Proceedings Article | 29 June 1998 Paper
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Etching, Deep ultraviolet, Lithography, Silicon, Metals, Reflection, Antireflective coatings, Plasma enhanced chemical vapor deposition, Reflectivity, Refractive index

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Tin, Deep ultraviolet, Nitrogen, Contamination, Chemically amplified resists, Oxygen, Plasma, Photoemission spectroscopy, Spectroscopy, Backscatter

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