Mr. Quinn J. Leonard Profile

Quinn J. Leonard

at Univ of Wisconsin

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Author

Publications (9)

Proceedings Article | 21 November 2002 Paper

Progress in the fabrication of high-aspect-ratio zone plates by soft x-ray lithography

Ralu Divan, Derrick Mancini, Nicolai Moldovan, Barry Lai, Lahsen Assoufid, Quinn Leonard, Franco Cerrina

Proceedings Volume 4783, (2002) https://doi.org/10.1117/12.451019

KEYWORDS: Gold, Polymethylmethacrylate, Zone plates, X-rays, Hard x-rays, X-ray lithography, Electroplating, Scanning electron microscopy, Plating, Photomasks

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Proceedings Article | 21 July 2000 Paper

Demagnification by bias in proximity x-ray lithography

Kong Jong Ren, Quinn Leonard, Yuli Vladimirsky, Antony Bourdillon

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390044

KEYWORDS: Photomasks, X-ray lithography, Lithography, Diffraction, Printing, X-rays, Photoresist processing, Critical dimension metrology, Standards development, Synchrotrons

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm imaging in x-ray lithography

Olga Vladimirsky, Niru Dandekar, Wenlong Jiang, Quinn Leonard, Klaus Simon, Srinivas Bollepalli, Yuli Vladimirsky, James Taylor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351161

KEYWORDS: Photomasks, Lithography, X-ray lithography, Diffraction, X-rays, Opacity, Synchrotrons, Near field diffraction, Photoresist processing, Printing

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Proceedings Article | 25 June 1999 Paper

X-ray mask fabrication at CXrL

Quinn Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Taylor, Klaus Simon, Lynn Rathbun, Richard Tiberio

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351147

KEYWORDS: Photomasks, X-rays, Gold, Etching, X-ray lithography, Photoresist materials, Lithography, Silicon, Electron beam lithography, Scanning electron microscopy

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Proceedings Article | 7 July 1997 Paper

High-volume production stepper for x-ray lithography

Klaus Simon, R. Macklin, Robert Selzer, Quinn Leonard, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275773

KEYWORDS: Semiconducting wafers, X-ray lithography, Optical alignment, X-rays, Photomasks, Prototyping, Lithography, Overlay metrology, Control systems, Wafer manufacturing

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Proceedings Article | 7 July 1997 Paper

X-ray phase mask: nanostructures

Zheng Chen, Quinn Leonard, Mumit Khan, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275775

KEYWORDS: Photomasks, X-rays, X-ray lithography, Polymethylmethacrylate, Phase shifts, Semiconducting wafers, Nanostructures, Silicon carbide, Lithography, Silicon

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Proceedings Article | 7 July 1997 Paper

X-ray mask replication using a Suss stepper at CXrL

Quinn Leonard, John Wallace, Olga Vladimirsky, Yuli Vladimirsky, Klaus Simon, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275790

KEYWORDS: Photomasks, X-rays, Kinematics, Semiconducting wafers, X-ray lithography, Lithography, Silicon, Distortion, Glasses, Gold

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Proceedings Article | 19 May 1995 Paper

Resolution and components of critical dimension variation in x-ray lithography

Kathleen Early, David Trindade, Quinn Leonard, Franco Cerrina, Klaus Simon, Mark McCord, Daniel DeMay

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209183

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Etching, X-ray lithography, X-rays, Error analysis, Synchrotrons, Metrology

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Proceedings Article | 15 September 1993 Paper

Track oriented chemically-amplified resist processes for quarter-micron lithography

Michael Reilly, Azalia Krasnoperova, Quinn Leonard, James Taylor, Shaowie Pan

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154768

KEYWORDS: Photoresist processing, X-ray lithography, Lithography, Standards development, Photomasks, Data processing, Semiconducting wafers, Optimization (mathematics), Algorithm development, Diffusion

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Showing 5 of 9 publications

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