Dr. Rafael Howell
at ASML, Inc.
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 26 February 2021 Presentation
Proc. SPIE. 11613, Optical Microlithography XXXIV

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Pattern recognition, Electroluminescence, Scanning electron microscopy, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Data modeling, Image processing, Photomasks, Machine learning, Computational lithography, Optical proximity correction, SRAF, Model-based design

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Plasma etching, Optical proximity correction, Reactive ion etching, Plasma

Showing 5 of 15 publications
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