Raghu Chalasani
at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Point spread functions, Data modeling, Calibration, 3D modeling, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design

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