Dr. Rainer Köning Profile

Dr. Rainer Köning

Research at Physikalisch-Technische Bundesanstalt

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 23 August 2023 Presentation

Efficient simulation of microscopic imaging for reconstruction of nanostructures

Phillip Manley, Jan Krüger, Bernd Bodermann, Rainer Köning, Andreas Heinrich, Christian Eder, Aksel Goehnermeier, Ulrike Zeiser, Martin Hammerschmidt, Lin Zschiedrich, Philipp-Immanuel Schneider

Proceedings Volume PC12619, PC126190B (2023) https://doi.org/10.1117/12.2673077

KEYWORDS: Nanostructures, Electron microscopy, Scattering, Diffraction limit, Diffraction, Optical microscopy, Near field optics, Near field, Multilayers, Modeling

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Proceedings Article | 23 August 2023 Presentation

On aberration retrieval for optical microscopes in length metrology

Jan Krüger, Bernd Bodermann, Rainer Köning, Phillip Manley, Lin Zschiedrich, Philipp-Immanuel Schneider, Andreas Heinrich, Christian Eder, Ulrike Zeiser, Aksel Goehnermeier

Proceedings Volume PC12619, PC126190A (2023) https://doi.org/10.1117/12.2672294

KEYWORDS: Optical aberrations, Imaging systems, Optical microscopes, Metrology, Point spread functions, Simulations, Reflection, Quality systems, Polarization, Objectives

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Proceedings Article | 20 May 2022 Paper

Reconstructing phase aberrations for high-precision dimensional microscopy

Philipp-Immanuel Schneider, Phillip Manley, Jan Krüger, Lin Zschiedrich, Rainer Köning, Bernd Bodermann, Sven Burger

Proceedings Volume 12137, 121370I (2022) https://doi.org/10.1117/12.2620762

KEYWORDS: Microscopes, Finite element methods, Microscopy, Data modeling, Image processing, Dimension reduction, Process modeling, Model-based design

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Proceedings Article | 12 September 2021 Presentation

Demonstrating a model-based edge detection and the impact of the illumination pupil’s discretization in optical microscopy

Jan Krüger, Rainer Köning, Bernd Bodermann

Proceedings Volume 11875, 118750D (2021) https://doi.org/10.1117/12.2600086

KEYWORDS: Model-based design, Edge detection, Optical microscopy, Optical simulations, Nanostructures, Finite element methods, Standards development, Refraction, Optical design, Numerical simulations

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A model-based edge detection is always required when quantitatively evaluating the bidirectional measurements of micro- and nanostructures in optical microscopy. For example, the accurate determination of the width of a structure requires the knowledge of the location of the real physical edges in the measured profile. The interpretation of the measured edge profile cannot be performed intuitively due to distortion which is caused by diffraction and refraction. We advise a model-based edge detection algorithm which is based on rigorous simulations of the microscope’s imaging. The intensity level which corresponds to the position of the real physical edge is called the threshold and it is determined in the simulations. For these optical simulations we employ the JCMsuite, which is a software application of the finite-element-method (FEM). Since numerical and semi-analytical methods for the calculation of electromagnetics in optical systems rely to some degree on approximations, their results may vary even when the input parameters are identical. We apply a test suite of input parameters for the purpose of comparing numerical simulation tools regarding the resulting thresholds for measurements on line-shaped nanostructures in a periodic grating. The test suite maintains the illumination and imaging parameters of a transmitted light UV-microscope while the object parameters of a binary line grating are varied. There are 25 grating configurations with different line-to-space ratios, where the line width ranges from the resolution limit up to almost 10 µm. The illumination pupil is discretized in a cartesian grid with 113 grid points in total. We introduce different pupil samplings, after calculating the threshold values of the original test suite. We obtain a high agreement of the thresholds results and the related linewidth values when comparing with already performed results of two additional rigorous applications. Furthermore, we showcase the threshold variation for different samplings of the illumination pupil.

Proceedings Article | 20 June 2021 Presentation

Characterization of the optical aberrations of a metrological UV microscope

Jan Krüger, Bernd Bodermann, Rainer Köning, Wolfgang Haessler-Grohne, Han Xu

Proceedings Volume 11783, 117830F (2021) https://doi.org/10.1117/12.2592566

KEYWORDS: Optical aberrations, Microscopes, Metrology, Ultraviolet radiation, Optical components, Imaging systems, Image processing, Zernike polynomials, Visibility, Quantitative analysis

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Proceedings Article | 21 June 2019 Presentation + Paper

Systematic approach on illustrating the challenges represented by optical bidirectional measurements using rigorous simulations

Jan Krüger, Rainer Köning, Bernd Bodermann

Proceedings Volume 11057, 110570D (2019) https://doi.org/10.1117/12.2527973

KEYWORDS: Finite element methods, Diffraction, Microscopes, Imaging systems, Optical testing, Diffraction gratings, Quartz, Computer simulations

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SPIE Journal Paper | 22 May 2014

Improved measurement performance of the Physikalisch-Technische Bundesanstalt nanometer comparator by integration of a new Zerodur sample carriage

Jens Flügge, Rainer Köning, Eugen Schötka, Christoph Weichert, Paul Köchert, Harald Bosse, Horst Kunzmann

OE, Vol. 53, Issue 12, 122404, (May 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.12.122404

KEYWORDS: Interferometers, Zerodur, Computer programming, Photomasks, Calibration, Metrology, Mirrors, Manufacturing, Microscopes

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Proceedings Article | 13 May 2013 Paper

The road towards accurate optical width measurements at the industrial level

Bernd Bodermann, Rainer Köning, Detlef Bergmann, Egbert Buhr, Wolfgang Hässler-Grohne, Jens Flügge, Harald Bosse

Proceedings Volume 8788, 87881S (2013) https://doi.org/10.1117/12.2021888

KEYWORDS: Calibration, Optical testing, Microscopes, Imaging systems, Edge roughness, Metrology, Objectives, Photomasks, Geometrical optics, Diffraction

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Proceedings Article | 17 June 2009 Paper

A model based approach to reference-free straightness measurement at the Nanometer Comparator

C. Weichert, M. Stavridis, M. Walzel, C. Elster, A. Wiegmann, M. Schulz, R. Köning, J. Flügge, R. Tutsch

Proceedings Volume 7390, 73900O (2009) https://doi.org/10.1117/12.827681

KEYWORDS: Sensors, Error analysis, Interferometers, Mirrors, Microscopes, Computer programming, Calibration, Environmental sensing, Virtual reality, Head

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Proceedings Article | 12 January 2009 Paper

Interferometry at the PTB Nanometer Comparator: design, status and development

J. Flügge, Ch. Weichert, H. Hu, R. Köning, H. Bosse, A. Wiegmann, M. Schulz, C. Elster, R. Geckeler

Proceedings Volume 7133, 713346 (2009) https://doi.org/10.1117/12.821252

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Proceedings Article | 17 October 2008 Paper

Development of a 1.5D reference comparator for position and straightness metrology on photomasks

J. Flügge, R. Köning, Ch. Weichert, W. Häßler-Grohne, R. Geckeler, A. Wiegmann, M. Schulz, C. Elster, H. Bosse

Proceedings Volume 7122, 71222Y (2008) https://doi.org/10.1117/12.801251

KEYWORDS: Interferometers, Photomasks, Metrology, Mirrors, Computer programming, Calibration, Sensors, Microscopes, Beam splitters, Image registration

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Proceedings Article | 5 April 2007 Paper

Achievement of sub nanometer reproducibility in line scale measurements with the nanometer comparator

Rainer Köning, Jens Flügge, Harald Bosse

Proceedings Volume 6518, 65183F (2007) https://doi.org/10.1117/12.712121

KEYWORDS: Microscopes, Interferometers, Sensors, Metrology, Optical microscopes, Mirrors, Reflectors, Computer programming, Optical alignment, Calibration

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Proceedings Article | 18 August 2005 Paper

Characterising the performance of the PTB line scale interferometer by measuring photoelectric incremental encoders

Rainer Koening, Jens Fluegge, Harald Bosse

Proceedings Volume 5879, 587908 (2005) https://doi.org/10.1117/12.616332

KEYWORDS: Interferometers, Computer programming, Head, Laser induced plasma spectroscopy, Reflectors, Interference (communication), Sensors, Zerodur, Calibration, Vibration isolation

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Proceedings Article | 20 November 2003 Paper

Recent activities at PTB nanometer comparator

Jens Flugge, Rainer Koning, Harald Bosse

Proceedings Volume 5190, (2003) https://doi.org/10.1117/12.506908

KEYWORDS: Interferometers, Computer programming, Optical fibers, Microscopes, Optical microscopes, Calibration, Head, Metals, Bridges

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Proceedings Article | 20 November 2003 Paper

Line scale comparison Nano3

Harald Bosse, Wolfgang Haessler-Grohne, Jens Fluegge, Rainer Koening

Proceedings Volume 5190, (2003) https://doi.org/10.1117/12.506894

KEYWORDS: Metrology, Zerodur, Quartz

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Proceedings Article | 22 October 2001 Paper

Status of the nanometer comparator at PTB

Jens Fluegge, Rainer Koening

Proceedings Volume 4401, (2001) https://doi.org/10.1117/12.445631

KEYWORDS: Interferometers, Microscopes, Calibration, Sensors, Heterodyning, Computer programming, Beam splitters, Photomasks, Nd:YAG lasers, Bridges

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Proceedings Article | 2 June 2000 Paper

Accurate dimensional metrology with atomic force microscopy

Ronald Dixson, Rainer Koening, Joseph Fu, Theodore Vorburger, Brian Renegar

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386492

KEYWORDS: Atomic force microscopy, Calibration, Standards development, Metrology, Interferometers, Sensors, Dimensional metrology, Capacitance, Holography, Prototyping

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Proceedings Article | 30 November 1999 Paper

Step-height metrology for data storage applications

Rainer Koening, Ronald Dixson, Joseph Fu, Brian Renegar, Theodore Vorburger, Vincent Tsai, Michael Postek

Proceedings Volume 3806, (1999) https://doi.org/10.1117/12.371161

KEYWORDS: Calibration, Interferometers, Metrology, Data storage, Compact discs, Atomic force microscopy, Capacitance, Head, Metals, Atomic force microscope

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Proceedings Article | 14 June 1999 Paper

Dimensional metrology with the NIST calibrated atomic force microscope

Ronald Dixson, Rainer Koening, Vincent Tsai, Joseph Fu, Theodore Vorburger

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350822

KEYWORDS: Calibration, Atomic force microscopy, Capacitance, Sensors, Edge detection, Metrology, Interferometers, Silicon, Motion measurement, Dimensional metrology

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Proceedings Article | 8 June 1998 Paper

Measurement of pitch and width samples with the NIST calibrated atomic force microscope

Ronald Dixson, Rainer Koening, Theodore Vorburger, Joseph Fu, Vincent Tsai

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308751

KEYWORDS: Calibration, Error analysis, Standards development, Metrology, Interferometers, Atomic force microscopy, Atomic force microscope, Resistance, Silicon, Heterodyning

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Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length scales. To achieve high accuracy, the scales of an AFM must be calibrated. Presently available standards for this purpose are commonly calibrated using stylus instruments and optical techniques. We have developed the calibrated AFM (C-AFM) in order to calibrate pitch and height standards using an AFM. Our instrument has metrology traceable to the wavelength of light for all three axes. This is accomplished through the integration of a flexure x-y translation stage, heterodyne laser interferometers, and a digital-signal-processor based closed-loop feedback system to control the x-y scan motion. The z-axis translation is accomplished using a piezoelectric actuator with an integrated capacitance sensor, which is calibrated using a heterodyne laser interferometer. When fully developed, this instrument will be a calibration tool for pitch and height standards for scanning probe microscopes. We have recently completed a reevaluation of the titling motions of the C-AFM scanner. This has allowed a refinement in our estimate of the Abbe error contribution to our measurement uncertainty. Our most recent pitch measurements are consistent with this new estimate and thus support our refined uncertainty budget. We have recently completed measurements of pitch on several samples, including both grid type and linear scale patterns, for an industrial user. We are also working toward the development of linewidth standards through the comparison of C-AFM width measurements with values obtained from other methods, including an electrical resistance techniques. In this paper, we will describe the current status of the C-AFM, discuss the use of the instrument for measurements of pitch and width, and describe our plans for future measurements.

Showing 5 of 20 publications

Conference Committee Involvement (3)

Modeling Aspects in Optical Metrology IX

26 June 2023 | Munich, Germany

Modeling Aspects in Optical Metrology VIII

21 June 2021 | Online Only, Germany

Modeling Aspects in Optical Metrology VII

24 June 2019 | Munich, Germany

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