Dr. Rainer Lebert
Senior Manager/EUV-XUV Solutions at RI Research Instruments GmbH
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 13 October 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Lithographic illumination, Phase shifts, Semiconducting wafers, Image resolution, Diffraction, Extreme ultraviolet lithography, Optical lithography

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Control systems, Pellicles, Optical components, Reflectivity, Defect inspection, Semiconductors, Photomasks

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Reflectivity, Thin films, EUV optics, Scanners, Reflection, Precision measurement

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Reflection, Scanners, Mirrors, Charge-coupled devices, Extreme ultraviolet lithography, Optical filters, Metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Scanners, Reflectometry, Reflection, Charge-coupled devices, Metrology, Optical filters

Showing 5 of 38 publications
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