Rainer M. Schmid
Product Manager E-Beam Products at Carl Zeiss SMT Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 21 June 2006 Paper
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Polarization, Photomasks, Scanners, Reticles, Semiconducting wafers, Transmittance, Phase shifts, Printing, Immersion lithography, Semiconductors

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Polarization, Liquids, Reticles, Critical dimension metrology, Binary data, Imaging systems, Refractive index

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Photomasks, Image resolution, Semiconducting wafers, Lithography, Reticles, Binary data, Optical proximity correction, 193nm lithography, Airborne remote sensing, Scanners

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Photomasks, Semiconducting wafers, Imaging systems, Reticles, Critical dimension metrology, Optical proximity correction, Lithographic illumination, Scanners, Lithography, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Crystals, Reticles, Inspection, Photomasks, Printing, Semiconducting wafers, Scanners, Lithographic illumination, Raman spectroscopy

Showing 5 of 7 publications
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