Prof. Rainer Tutsch Profile

Prof. Rainer Tutsch

at Technische Univ Braunschweig

SPIE Involvement:

Conference Program Committee | Conference Co-Chair | Author | Editor

Publications (23)

SPIE Journal Paper | 25 August 2020

Traceable calibration of Shack–Hartmann wavefront sensors employing spherical wavefronts

Johannes Bautsch, Markus Schake, Gerd Ehret, Ulrich Berg, Lorenz Wagner, Johannes Pfund, Rainer Tutsch

OE Vol. 59 Issue 08

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SPIE Journal Paper | 3 March 2020

Effects of misalignments on the modulation transfer function measurement of camera lenses analyzed in optomechanical simulations

Melissa Schenker, Manuel Stavridis, Michael Schulz, Rainer Tutsch

OE Vol. 59 Issue 03

KEYWORDS: Modulation transfer functions, Sensors, Monte Carlo methods, Lenses, Spatial frequencies, Cameras, Error analysis, Collimators, Optical engineering, Tolerancing

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Proceedings Article | 5 May 2012 Paper

Optical measurement of the layer thickness of transparent materials

H. Dierke, R. Tutsch

Proc. SPIE. 8430, Optical Micro- and Nanometrology IV

KEYWORDS: Gold, Confocal microscopy, Refractive index, Optical sensors, Silica, Interferometers, Silicon, Optical testing, Photoresist materials, Aluminum

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SPIE Journal Paper | 1 October 2011

Optical three-dimensional metrology with structured illumination

Rainer Tutsch, Marcus Petz, Marc Fischer

OE Vol. 50 Issue 10

KEYWORDS: Cameras, 3D metrology, Sensors, Imaging systems, Binary data, Mirrors, Projection systems, Raster graphics, Illumination engineering, Photogrammetry

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Proceedings Article | 27 May 2011 Paper

Detection of micro-probe displacement using a Shack-Hartmann wavefront sensor

H. Dierke, C. Schrader, R. Tutsch

Proc. SPIE. 8082, Optical Measurement Systems for Industrial Inspection VII

KEYWORDS: Microlens array, Sensors, Silicon, Wavefront sensors, Microlens, Charge-coupled devices, Optical alignment, CCD image sensors, Semiconducting wafers, Signal detection

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Proceedings Article | 14 May 2010 Paper

Evaluation of LCD monitors for deflectometric measurement systems

Marc Fischer, Marcus Petz, Rainer Tutsch

Proc. SPIE. 7726, Optical Sensing and Detection

KEYWORDS: Modulation, Imaging systems, Cameras, Calibration, Electrodes, Glasses, Molecules, Manufacturing, LCDs, Projection systems

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Proceedings Article | 17 June 2009 Paper

A model based approach to reference-free straightness measurement at the Nanometer Comparator

C. Weichert, M. Stavridis, M. Walzel, C. Elster, A. Wiegmann, M. Schulz, R. Köning, J. Flügge, R. Tutsch

Proc. SPIE. 7390, Modeling Aspects in Optical Metrology II

KEYWORDS: Microscopes, Mirrors, Interferometers, Sensors, Calibration, Error analysis, Computer programming, Head, Virtual reality, Environmental sensing

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Proceedings Article | 27 May 2009 Paper

SEM image contrast modeling for mask and wafer metrology

C. Frase, D. Gnieser, K.-P. Johnsen, W. Häßler-Grohne, R. Tutsch, H. Bosse

Proc. SPIE. 7470, 25th European Mask and Lithography Conference

KEYWORDS: Electron beams, Metrology, Scattering, Sensors, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Optical simulations, Semiconducting wafers

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Proceedings Article | 19 January 2009 Paper

Three-dimensional shape measurement of aspheric refractive optics by pattern transmission photogrammetry

Marcus Petz, Marc Fischer, Rainer Tutsch

Proc. SPIE. 7239, Three-Dimensional Imaging Metrology

KEYWORDS: Reflection, Imaging systems, Cameras, Calibration, Optical testing, Photogrammetry, Deflectometry, Aspheric lenses, Chemical elements, Optimization (mathematics)

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Proceedings Article | 3 October 2008 Paper

Random-phase-shift Fizeau interferometer

Nicolae Radu Doloca, Rainer Tutsch

Proc. SPIE. 7155, Ninth International Symposium on Laser Metrology

KEYWORDS: Interferometers, Cameras, Sensors, Interferometry, Wavefronts, Photodiodes, Phase interferometry, CCD cameras, CCD image sensors, Phase shifts

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Proceedings Article | 11 August 2008 Paper

Phase-shift Fizeau interferometer in presence of vibration

Radu Doloca, Hagen Broistedt, Rainer Tutsch

Proc. SPIE. 7064, Interferometry XIV: Applications

KEYWORDS: Interferometers, Sensors, Interferometry, Wavefronts, Photodiodes, Semiconductor lasers, CCD cameras, CCD image sensors, Camera shutters, Phase shifts

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Proceedings Article | 10 October 2007 Paper

Tracking the propagation of type B PLC bands

Marc Fischer, Leobaldo Casarotto, Sebastian Strube, Rainer Tutsch

Proc. SPIE. 6716, Optomechatronic Sensors and Instrumentation III

KEYWORDS: Detection and tracking algorithms, Cameras, Image resolution, Image analysis, Temporal resolution, Wave propagation, Data processing, High speed cameras, Photonic integrated circuits, Line scan image sensors

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Proceedings Article | 10 October 2007 Paper

Accurate and robust optical 3D position control in microassembly using fluorescent fiducial marks

Michael Berndt, Rainer Tutsch

Proc. SPIE. 6716, Optomechatronic Sensors and Instrumentation III

KEYWORDS: Mirrors, Cameras, Sensors, Image processing, Luminescence, Surface roughness, Optical testing, Head, Image sensors, 3D vision

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Proceedings Article | 18 June 2007 Paper

Vertical scanning interferometry with a mixed-coherence light source

Gabor Molnar, Rainer Tutsch

Proc. SPIE. 6616, Optical Measurement Systems for Industrial Inspection V

KEYWORDS: Laser sources, Microscopes, Beam splitters, Light sources, Interferometers, Lamps, Interferometry, Digital cameras, Signal processing, Light

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Proceedings Article | 14 August 2006 Paper

Vibration induced phase-shift interferometer

Radu Doloca, Rainer Tutsch

Proc. SPIE. 6292, Interferometry XIII: Techniques and Analysis

KEYWORDS: Optical fibers, Optical filters, Fringe analysis, Sensors, Photodiodes, Semiconductor lasers, CCD cameras, Signal detection, Pulsed laser operation, Phase shifts

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Proceedings Article | 19 August 2005 Paper

Reflection grating photogrammetry: a technique for absolute shape measurement of specular free-form surfaces

Marcus Petz, Rainer Tutsch

Proc. SPIE. 5869, Optical Manufacturing and Testing VI

KEYWORDS: Mirrors, Reflection, Imaging systems, Cameras, Calibration, Image processing, Photogrammetry, LCDs, Projection systems, Raster graphics

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Proceedings Article | 13 June 2005 Paper

Enhancement of image contrast by fluorescence in microtechnology

Michael Berndt, Rainer Tutsch

Proc. SPIE. 5856, Optical Measurement Systems for Industrial Inspection IV

KEYWORDS: Chromatic aberrations, Light emitting diodes, Optical lithography, Cameras, Sensors, Image processing, Luminescence, Head, Image contrast enhancement, Microtechnology

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New developments in production technology increasingly focus on hybrid microsystems. Especially for systems with movable components, the process step of assembly is mandatory. In general, the accuracy of positioning of the parts has to be better than 1 μm. This makes specialized and automated production equipment necessary, which can lead to a conflict with the aim of flexibility of the range of products. Design for manufacturing is a well known remedy. Assembly aids are common practice today. These features of the workpieces bear no functionality for the end product but considerably ease certain process steps. By standardization of assembly aids generalized production equipment free from product-specific features could be developed. In our contribution, we demonstrate the photogrammetric determination of the positions of workpieces without reference to their exterior shape, using circular fiducial marks of 150 μm in diameter. The surface properties of the workpieces, however, still have an influence on image formation. As an example, the marks may be hidden by local specular reflections. A solution to this problem is to add an exclusive optical property to the fiducial marks to get an image with high contrast against the surface of the workpiece. In biology and medicine samples are stained with fluorescing dyes to enhance the contrast in optical microscopy. In fluorochromes, light of a characteristic wavelength is emitted after the absorption of light with a shorter wavelength. In our experiments we added a fluorochrome to a common photoresist and coated the surface of the workpiece with a thin layer thereof. Using photolithography as a patterning technique we generated fiducial marks with structures down to 25 μm. These marks can be identified by their characteristic emission wavelength under short-wavelength illumination. Only the fiducial marks remain visible in the images and processing these images is straightforward. The generation of fluorescing patterns by photolithography opens new possibilities for testing and process control in many fields of microtechnology.

Proceedings Article | 30 September 2003 Paper

3D sensor for the control of a microassembly robot

Rainer Tutsch, Marcus Petz, Michael Berndt, Jurgen Hesselbach, Gero Pokar, Kerstin Heuer

Proc. SPIE. 5264, Optomechatronic Systems IV

KEYWORDS: Optical sensors, Cameras, Sensors, Control systems, Optical fabrication, Photogrammetry, Head, Light sources and illumination, C++, 3D image processing

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Proceedings Article | 30 May 2003 Paper

Measurement of optically effective surfaces by imaging of gratings

Marcus Petz, Rainer Tutsch

Proc. SPIE. 5144, Optical Measurement Systems for Industrial Inspection III

KEYWORDS: Optical components, Mirrors, Phase shifting, Reflection, Imaging systems, Cameras, Reflectivity, Interferometry, Optical testing, Refraction

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Proceedings Article | 18 October 2002 Paper

Parallel robot for micro-assembly with integrated innovative optical 3D sensor

Juergen Hesselbach, Diana Ispas, Gero Pokar, Sven Soetebier, Rainer Tutsch

Proc. SPIE. 4902, Optomechatronic Systems III

KEYWORDS: Mirrors, Imaging systems, Cameras, Sensors, Kinematics, CCD cameras, Head, Image sensors, Process control, 3D image processing

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Proceedings Article | 23 October 2001 Paper

Microphotogrammetry for 3D strain measurement and microassembly control

Rainer Tutsch, Reinhold Ritter, Diana Ispas, Marcus Petz, Leobaldo Casarotto

Proc. SPIE. 4400, Microsystems Engineering: Metrology and Inspection

KEYWORDS: Interferometers, Cameras, Image processing, Control systems, Photogrammetry, Speckle interferometry, 3D metrology, Stochastic processes, Surface finishing, 3D image processing

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Proceedings Article | 19 August 1996 Paper

Aspheric form testing using multiple-wavelength approaches in combination with subNyquist techniques

Tilo Pfeifer, Horst Mischo, Jens Evertz, Rainer Tutsch

Proc. SPIE. 2775, Specification, Production, and Testing of Optical Components and Systems

KEYWORDS: Signal to noise ratio, Chromatic aberrations, Mirrors, Fringe analysis, Manufacturing, Interferometry, Wavefronts, CCD cameras, Aspheric optics, Aspheric lenses

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Proceedings Article | 1 January 1993 Paper

Testing aspherics without rotational symmetry using a Fizeau interferometer with computer-generated holograms

Tilo Pfeifer, Jens Evertz, Rainer Tutsch, Hendrik Rothe

Proc. SPIE. 1781, Specification and Measurement of Optical Systems

KEYWORDS: Diffraction, Mirrors, Holograms, Interferometers, Wavefronts, Optical testing, Computer generated holography, Aspheric lenses, Optics manufacturing, Fizeau interferometers

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Showing 5 of 23 publications

Proceedings Volume Editor (8)

SPIE Conference Volume | 15 June 2020

Optical Technology and Measurement for Industrial Applications 2020

SPIE Conference Volume | 17 November 2008

Optomechatronic Technologies 2008

SPIE Conference Volume | 8 October 2007

Optomechatronic Sensors and Instrumentation III

SPIE Conference Volume | 12 October 2006

Optomechatronic Actuators, Manipulation, and Systems Control

SPIE Conference Volume | 5 December 2005

Optomechatronic Actuators and Manipulation

Showing 5 of 8 publications

Conference Committee Involvement (28)

Optical Measurement Systems for Industrial Inspection XII

21 June 2021 | Munich, Germany

Optical Technology and Measurement for Industrial Applications Conference

20 April 2021 | Chiba, Japan

Optical Technology and Measurement for Industrial Applications Conference

22 April 2020 | Yokohama, Japan

Optical Measurement Systems for Industrial Inspection XI

24 June 2019 | Munich, Germany

Optical Technology and Measurement for Industrial Applications Conference

23 April 2019 | Yokohama, Japan

Optical Measurement Systems for Industrial Inspection X

26 June 2017 | Munich, Germany

Optical Measurement Systems for Industrial Inspection IX

22 June 2015 | Munich, Germany

Interferometry XVII: Advanced Applications

19 August 2014 | San Diego, California, United States

Dimensional Optical Metrology and Inspection for Practical Applications III

5 May 2014 | Baltimore, Maryland, United States

Dimensional Optical Metrology and Inspection for Practical Applications II

25 August 2013 | San Diego, California, United States

Optical Measurement Systems for Industrial Inspection VIII

13 May 2013 | Munich, Germany

Optical Metrology and Inspection for Industrial Applications II

5 November 2012 | Beijing, China

Interferometry XVI: Applications

14 August 2012 | San Diego, California, United States

Dimensional Optical Metrology and Inspection for Practical Applications

22 August 2011 | San Diego, California, United States

Optical Metrology and Inspection for Industrial Applications

18 October 2010 | Beijing, China

Interferometry XV: Applications

3 August 2010 | San Diego, California, United States

Optomechatronic Sensors and Instrumentation IV

18 November 2008 | San Diego, California, United States

Interferometry XIV: Applications

13 August 2008 | San Diego, California, United States

Optomechatronic Sensors and Instrumentation III

8 October 2007 | Lausanne, Switzerland

Optomechatronic Actuators and Manipulation II

1 October 2006 | Boston, Massachusetts, United States

Interferometry XIII: Applications

16 August 2006 | San Diego, California, United States

Optomechatronic Actuators and Manipulation

5 December 2005 | Sapporo, Japan

Optomechatronic Technologies 2005

5 December 2005 | Sapporo, Japan

Machine Vision and its Optomechatronic Applications

26 October 2004 | Philadelphia, Pennsylvania, United States

Optomechatronic Sensors, Actuators, and Control

25 October 2004 | Philadelphia, Pennsylvania, United States

Interferometry XII: Applications

4 August 2004 | Denver, Colorado, United States

Optomechatronic Systems IV

28 October 2003 | Providence, RI, United States

Photonics Technologies for Robotics, Automation, and Manufacturing

27 October 2003 | Providence, United States

Showing 5 of 28 Conference Committees

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